Erratum: “Enhanced transport properties in GaN heterostructures with sputter-epitaxy-grown ScAlN barriers via thermal annealing” [Appl. Phys. Lett. <b>127</b> , 182103 (2025)]
Article Details
Journal Info
Applied Physics Letters
American Institute of Physics
Authors (14)
Tomoya Okuda
Department of Materials Science and Technology, Tokyo University of Science 1 , Tokyo 125-8585,
Shunsuke Ota
Department of Materials Science and Technology, Tokyo University of Science 1 , Tokyo 125-8585,
Kouei Kubota
Department of Electrical Engineering and Information Systems, The University of Tokyo 1 , 7-3-1, Hongo, Bunkyo, Tokyo 113-8656,
Yusuke Wakamoto
Department of Electrical Engineering and Information Systems, The University of Tokyo 1 , Bunkyo, Tokyo 113-8656,
Shinsuke Hashimoto
Institute of Engineering Innovation, School of Engineering, The University of Tokyo 3 , Tokyo 113-8656,
Takehito Seki
Satoko Toyama
Institute of Engineering Innovation, School of Engineering, The University of Tokyo 2 , Tokyo 113-8656,
Naoya Shibata
Institute of Engineering Innovation, School of Engineering
Takahiko Kawahara
Transmission Devices Laboratory, Sumitomo Electric Industries Ltd 4 ., Yokohama 244-8588,
Kozo Makiyama
Transmission Devices Laboratory, Sumitomo Electric Industries Ltd 4 ., Yokohama 244-8588,
Ken Nakata
Kazuhisa Ikeda
Department of Materials Science and Technology, Tokyo University of Science 1 , Tokyo 125-8585,
Takuya Maeda
Atsushi Kobayashi
Department of Chemistry Faculty of Science Hokkaido University Sapporo Hokkaido Japan