Epitaxial growth of topological insulator <b> <i>β</i> </b> -Ag2Te thin films

A Ayuki Takegawa (Department of Advanced Materials Science, The University of Tokyo 1 , Kashiwa, Chiba 227-8561,) K Kouya Imoto (Department of Applied Physics, The University of Tokyo 2 , Bunkyo-ku, Tokyo 113-8656,) M Minoru Kawamura M Moeta Tsukamoto (Department of Advanced Materials Science, The University of Tokyo 1 , Kashiwa, Chiba 227-8561,) R Ryutaro Yoshimi

Abstract

We report epitaxial growth of β-Ag2Te thin films by molecular beam epitaxy. β-Ag2Te, recently identified as a topological insulator, was grown by depositing Ag on an InP substrate at room temperature, followed by Te supply at an elevated temperature. X-ray diffraction measurements and transmission electron microscopy analyses confirmed the (002) crystal orientation and the epitaxial atomic arrangement of β-Ag2Te thin films. Electrical transport measurements revealed that the β-Ag2Te thin film exhibits two-dimensional metallic conduction while the bulk remains insulating. The epitaxial β-Ag2Te thin films obtained here provide a viable platform for investigating emergent phenomena arising from surface Dirac states and for designing heterojunction-based device structures.

Article Details

Volume / Issue Vol. 128, Issue 15
Published April 13, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (5)

A

Ayuki Takegawa

Department of Advanced Materials Science, The University of Tokyo 1 , Kashiwa, Chiba 227-8561,

K

Kouya Imoto

Department of Applied Physics, The University of Tokyo 2 , Bunkyo-ku, Tokyo 113-8656,

M

Minoru Kawamura

M

Moeta Tsukamoto

Department of Advanced Materials Science, The University of Tokyo 1 , Kashiwa, Chiba 227-8561,

R

Ryutaro Yoshimi