Enhanced mobility via diluted polarization in graded AlGaN/GaN systems

C Chee-How Lu (Industry Academia Innovation School, National Yang-Ming Chiao-Tung University 1 , Hsinchu 30010,) K Kazuki Kodama (Industry Academia Innovation School Wide Bandgap Compound Semiconductor Research Center, National Yang-Ming Chiao-Tung University 3 , Hsinchu 30010,) B Bing-Syuan Li (International College of Semiconductor Technology, National Yang-Ming Chiao-Tung University 4 , Hsinchu 30010,) Y You-Chen Weng (Industry Academia Innovation School Wide Bandgap Compound Semiconductor Research Center, National Yang-Ming Chiao-Tung University 3 , Hsinchu 30010,) C Chih-Yi Yang (International College of Semiconductor Technology, National Yang-Ming Chiao-Tung University 4 , Hsinchu 30010,) Y Yi-Qi Wang (Department of Materials Science and Engineering, National Yang-Ming Chiao-Tung University 5 , Hsinchu 30010,) C Chien-Wei Chen (National Center for Instrumentation Research, National Institutes of Applied Research 2 , Hsinchu 300092,) C Chan-Yuen Chang (National Center for Instrumentation Research, National Institutes of Applied Research 2 , Hsinchu 300092,) D Daisuke Ueda (Industry Academia Innovation School, National Yang-Ming Chiao-Tung University 1 , Hsinchu 30010,) E Edward Yi Chang

Abstract

This study investigates the influences of a graded AlGaN barrier layer on electron mobility in AlGaN/GaN heterostructures. By varying the graded layer thickness, we observed a systematic mobility enhancement from 1300 cm2/V s (abrupt interface) to 2070 cm2/V s at an optimal thickness of 10 nm. Beyond this threshold, mobility decreased due to the transition from two-dimensional electron gas conduction to three-dimensional parallel conduction, as confirmed by capacitance–voltage (C–V) measurements. The observed mobility enhancement is attributed to the suppression of Coulomb and alloy scattering facilitated by polarization dilution within the graded layer. Furthermore, fabricated AlGaN/graded barrier/GaN field effect transistors with a source–drain spacing of 20 μm exhibited a significant reduction in on-resistance, approximately 40% lower than conventional abrupt heterostructures. These findings highlight the potential of graded AlGaN barriers in optimizing carrier transport for next-generation high-electron-mobility transistors.

Article Details

Volume / Issue Vol. 127, Issue 7
Published August 18, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (10)

C

Chee-How Lu

Industry Academia Innovation School, National Yang-Ming Chiao-Tung University 1 , Hsinchu 30010,

K

Kazuki Kodama

Industry Academia Innovation School Wide Bandgap Compound Semiconductor Research Center, National Yang-Ming Chiao-Tung University 3 , Hsinchu 30010,

B

Bing-Syuan Li

International College of Semiconductor Technology, National Yang-Ming Chiao-Tung University 4 , Hsinchu 30010,

Y

You-Chen Weng

Industry Academia Innovation School Wide Bandgap Compound Semiconductor Research Center, National Yang-Ming Chiao-Tung University 3 , Hsinchu 30010,

C

Chih-Yi Yang

International College of Semiconductor Technology, National Yang-Ming Chiao-Tung University 4 , Hsinchu 30010,

Y

Yi-Qi Wang

Department of Materials Science and Engineering, National Yang-Ming Chiao-Tung University 5 , Hsinchu 30010,

C

Chien-Wei Chen

National Center for Instrumentation Research, National Institutes of Applied Research 2 , Hsinchu 300092,

C

Chan-Yuen Chang

National Center for Instrumentation Research, National Institutes of Applied Research 2 , Hsinchu 300092,

D

Daisuke Ueda

Industry Academia Innovation School, National Yang-Ming Chiao-Tung University 1 , Hsinchu 30010,

E

Edward Yi Chang