Engineering of disorder-immune metadevices based on Huygens congener dipole element

Abstract

Wavefront manipulation via Huygens metasurfaces is rapidly advancing and holds great potential for a wide range of optical applications. However, in low-cost and low-precision manufacturing scenarios, inevitable positional disorder poses a significant challenge to the realization of conventional Huygens metasurfaces. To address this, we consider a class of Huygens metasurfaces based on congener dipoles that exhibit inherent robustness against positional disorder. In this approach, a Huygens source is engineered by merging two parallel electric dipole modes. We systematically investigate how varying degrees of positional disorder affect the optical performance of metalenses and metadeflectors constructed with these metasurfaces. Simulation results reveal that even with random element displacements of up to 0.5, the congener-based metadevices retain their functional performance, with focusing efficiency decreasing by only 5%. This study demonstrates a robust and flexible design strategy for Huygens metasurfaces, paving the way for disorder-tolerant and cost-effective optical device.