Enabling thin p-GaN Ohmic contacts through ultrathin magnesium deposition and brief thermal annealing

H Haitao Wang (Department of Central Laboratory, College & Hospital of Stomatology, Anhui Provincial Key Laboratory of Oral Diseases Research, Anhui Medical University) S Shumeng Yan (Institute of Materials and Systems for Sustainability, Nagoya University 1 , Nagoya 464-8601,) Z Zhiyu Xu Y Yingying Lin (School of Chemistry and Molecular Engineering) P Peirong Yu (School of Engineering, Nagoya University 4 , Nagoya 464-8601,) J Joshua Jaehyung Park (Microsystems Technology Laboratories, Massachusetts Institute of Technology 6 , Cambridge, Massachusetts 02139,) J Joseph E. Dill (School of Applied Engineering Physics, Cornell University 7 , Ithaca, New York 14853,) H Hei Wong (Department of Electrical Engineering, City University of Hong Kong 8 , Hong Kong,) Q Qingyuan Han (Graduate School of Engineering, Nagoya University 9 , Nagoya 464-8601,) X Xigen Li (Graduate School of Engineering, Nagoya University 9 , Nagoya 464-8601,) Q Qian Sun T Tomás Palacios D Debdeep Jena (School of Electrical and Computer Engineering, Cornell University 2 , Ithaca, New York 14853,) H Huili Grace Xing (Institute of Materials and Systems for Sustainability, Nagoya University 1 , Nagoya 464-8601,) J Jia Wang H Hiroshi Amano (Institute of Materials and Systems for Sustainability, Nagoya University 1 , Nagoya 464-8601,)

Abstract

Gallium nitride (GaN) is a key semiconductor for optoelectronic and power electronic applications. However, achieving low-resistance Ohmic contacts to p-GaN remains challenging, particularly after plasma processing. Annealing of metallic magnesium (Mg) film on p-GaN has emerged as a promising approach, but severe surface roughening limits its applicability to thin (<100 nm) p-GaN layers widely used in practical devices. Here, we demonstrate a capless ultrathin (<10 nm) Mg deposition followed by a soft anneal (600 °C, 300 s) that forms a smooth, ultra-shallow, heavily acceptor-doped surface layer. The process maintains surface smoothness while achieving a low specific contact resistivity of (1–3) × 10−4 Ω cm2 at zero-bias with linear I–V characteristics, even on plasma-etched surfaces. Quasi-vertical p–i–n diodes fabricated using this approach exhibit low leakage currents and high breakdown voltages, indicating preserved junction integrity. This work provides a practical and scalable strategy for forming robust Ohmic contacts on thin p-GaN, with broad implications for GaN-based electronic and optoelectronic devices.

Article Details

Volume / Issue Vol. 129, Issue 6
Published August 10, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (16)

H

Haitao Wang

Department of Central Laboratory, College & Hospital of Stomatology, Anhui Provincial Key Laboratory of Oral Diseases Research, Anhui Medical University

S

Shumeng Yan

Institute of Materials and Systems for Sustainability, Nagoya University 1 , Nagoya 464-8601,

Z

Zhiyu Xu

Y

Yingying Lin

School of Chemistry and Molecular Engineering

P

Peirong Yu

School of Engineering, Nagoya University 4 , Nagoya 464-8601,

J

Joshua Jaehyung Park

Microsystems Technology Laboratories, Massachusetts Institute of Technology 6 , Cambridge, Massachusetts 02139,

J

Joseph E. Dill

School of Applied Engineering Physics, Cornell University 7 , Ithaca, New York 14853,

H

Hei Wong

Department of Electrical Engineering, City University of Hong Kong 8 , Hong Kong,

Q

Qingyuan Han

Graduate School of Engineering, Nagoya University 9 , Nagoya 464-8601,

X

Xigen Li

Graduate School of Engineering, Nagoya University 9 , Nagoya 464-8601,

Q

Qian Sun

T

Tomás Palacios

D

Debdeep Jena

School of Electrical and Computer Engineering, Cornell University 2 , Ithaca, New York 14853,

H

Huili Grace Xing

Institute of Materials and Systems for Sustainability, Nagoya University 1 , Nagoya 464-8601,

J

Jia Wang

H

Hiroshi Amano

Institute of Materials and Systems for Sustainability, Nagoya University 1 , Nagoya 464-8601,