Dual regulation of band asymmetry via GaSb layers for high-performance InAs/GaSb long-wavelength infrared nBn detectors
Abstract
We demonstrate a strategy to resolve the inherent trade-off between electron blocking and hole transport in InAs/GaSb type-II superlattice nBn structures by precisely tuning the GaSb layer number in the barrier. The underlying dual regulation mechanism of the band structure was investigated using 8-band k·p simulations. A series of superlattice barrier structures (4InAs/XGaSb, X = 5, 7, 9) were designed and fabricated into devices for electrical characterization. The effectiveness of our band-engineering approach was confirmed, as increasing the GaSb monolayers from 5 to 9 suppressed the dark current density at 77 K by two orders of magnitude (from 2.21 × 10−2 to 7.19 × 10−4 A/cm2), concurrently reducing the turn-on voltage from 400 to 100 mV. The optimized device exhibits a quantum efficiency of 30.04% and a specific detectivity of 2.37 × 1011 cm Hz1/2 W−1, demonstrating high performance for long-wavelength infrared detection. This work provides a general band-engineering strategy for developing high-performance long-wavelength infrared focal plane arrays.
Article Details
Journal Info
Applied Physics Letters
American Institute of Physics
Authors (10)
Yuhao Chen
Weiqiang Chen
Department of Civil and Environmental Engineering and Rice Advanced Materials Institute, Ken Kennedy Institute, Rice University, 6100 Main Street
Lidan Lu
Zhenfei Xing
School of Instrument Science and Opto-Electronics Engineering, Beijing Information Science and Technology University 1 , Beijing 100192,
Rong Yan
Jing Yu
Institute for Digital Molecular Analytics and Science (IDMxS), Nanyang Technological University, 59 Nanyang Drive, Singapore 636921, Singapore
Bingfeng Liu
Key Laboratory of the Ministry of Education for Optoelectronic Measurement Technology and Instrument, Beijing Information Science and Technology University 1 , Beijing 100192,
Mingli Dong
School of Instrument Science and Opto-Electronics Engineering, Beijing Information Science and Technology University 1 , Beijing 100192,
Dongwei Jiang
State Key Laboratory of Optoelectronic Materials and Devices, Institute of Semiconductors, Chinese Academy of Sciences 1 , Beijing 100083,
Lianqing Zhu