Dual-channel 2DEG micro-Hall effect sensor for extreme environments

S Satish Shetty (Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,) F Fernando Maia de Oliveira (Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,) S Savannah R. Eisner (Department of Electrical Engineering, Columbia University 4 , New York, New York 10027,) H Hryhorii Stanchu (Institute for Nanoscience and Engineering, University of Arkansas 4 , Fayetteville, Arkansas 72701,) A Anand Lalwani (Department of Aeronautics and Astronautics, Stanford University 5 , Stanford, California 94305,) D Dinesh Baral (Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,) Y Yuriy I. Mazur (Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,) D Debbie G. Senesky (Department of Aeronautics and Astronautics, Stanford University 5 , Stanford, California 94305,) H H. Alan Mantooth (Department of Electrical Engineering, University of Arkansas 3 , Fayetteville, Arkansas 72701,) G Gregory J. Salamo (Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,)

Abstract

We report a dual-channel two-dimensional electron gas (2DEG) micro-Hall sensor of AlN/GaN/AlN/GaN heterostructure for extreme environments. The fabricated Hall sensor shows a supply voltage-related sensitivity of ∼0.058 T−1 and a supply current-related sensitivity of ∼37.1 V A−1 T−1 at room temperature. It maintains a linear response from −193 to 407 °C in the range of magnetic fields of −0.25  to +0.25 T, with the bias range of 12 mA or 10 V. The temperature coefficient of sheet resistance is 1.1 Ω/°C, which reflects the usefulness in detecting temperature at the spatial location of high-power module. The measured Hall offset response time of ∼60 ns closely matches with the bias response of ∼63 ns, indicating that offset is in phase with the bias current. We also observed that, at low magnetic fields, the rise time is primarily influenced by offset voltage, whereas at higher fields, it is dominated by the slower response of the Hall signal. Furthermore, Hall signal phase shifts of 29.8° and 50.5° were observed at −60 and −240 mT, and 57.1° and 105° at +60 and +240 mT, respectively, and also provide an explanation for the observed correlation. This phase difference can be used to isolate the Hall signal from the Hall-offset with lock-in detection.

Article Details

Volume / Issue Vol. 128, Issue 7
Published February 16, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (10)

S

Satish Shetty

Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,

F

Fernando Maia de Oliveira

Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,

S

Savannah R. Eisner

Department of Electrical Engineering, Columbia University 4 , New York, New York 10027,

H

Hryhorii Stanchu

Institute for Nanoscience and Engineering, University of Arkansas 4 , Fayetteville, Arkansas 72701,

A

Anand Lalwani

Department of Aeronautics and Astronautics, Stanford University 5 , Stanford, California 94305,

D

Dinesh Baral

Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,

Y

Yuriy I. Mazur

Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,

D

Debbie G. Senesky

Department of Aeronautics and Astronautics, Stanford University 5 , Stanford, California 94305,

H

H. Alan Mantooth

Department of Electrical Engineering, University of Arkansas 3 , Fayetteville, Arkansas 72701,

G

Gregory J. Salamo

Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,