Double-channel AlGaN/GaN Schottky barrier diode with AlN super back barrier on SiC substrate

T Tao Zhang J Junjie Yu H Heyuan Chen (Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University 1 , Xi'an 710071,) Y Yachao Zhang H Huake Su (State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , Xi'an 710071,) S Shengrui Xu X Xiangdong Li H Hongchang Tao (State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , Xi'an 710071,) R Ruowei Liu (Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University 1 , Xi'an 710071,) Z Zeyang Ren (State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , Xi'an 710071,) W Weidong Zhu Y Yue Hao J Jincheng Zhang

Abstract

In this work, high-performance double-channel AlGaN/GaN Schottky barrier diodes with AlN super back barrier are demonstrated, and the corresponding current transport mechanisms at various anode bias voltages are studied. Benefiting from the electric field-modulated GaN double channel via polarized charge, high output current of 339 mA/mm and high breakdown voltage of 2.18 kV are obtained. The initial leakage current is dominated by thermionic emission, when the anode is biased at a small voltage. With the increase in anode voltage, electrons in the GaN channel are partly depleted, and two-dimensional variable-range hopping, through high-density trap states in the GaN-based material, dominates the total leakage current. When the anode reverse bias is large enough to fully deplete electrons in channel, the temperature-dependent leakage current shows little dependence on the applied anode voltage, and the trap-assisted tunneling model satisfies.

Article Details

Volume / Issue Vol. 126, Issue 23
Published June 09, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (13)

T

Tao Zhang

J

Junjie Yu

H

Heyuan Chen

Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University 1 , Xi'an 710071,

Y

Yachao Zhang

H

Huake Su

State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , Xi'an 710071,

S

Shengrui Xu

X

Xiangdong Li

H

Hongchang Tao

State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , Xi'an 710071,

R

Ruowei Liu

Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University 1 , Xi'an 710071,

Z

Zeyang Ren

State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , Xi'an 710071,

W

Weidong Zhu

Y

Yue Hao

J

Jincheng Zhang