Doping optimization of charge state stability for shallow nitrogen-vacancy center ensembles in HPHT diamonds
Abstract
Since nitrogen-vacancy (NV) centers in diamond have emerged as crucial quantum sensors in physics and biology, the massive preparation of high-quality and high-concentration shallow NV center samples has become urgent and demanding. As NV centers approach the surface and their concentration increases, charge state instability can degrade coherence and introduce additional noise. This problem is further complicated in high-pressure and high-temperature (HPHT) diamonds due to the presence of unclear impurities and inhomogeneous strain. Through optically detected magnetic resonance testing on various implanted samples, we analyzed the spin and charge state properties of shallow NV center ensembles. Our results reveal that the doping dose significantly influences the quantity of NV−, charge, and charge stability. Our findings indicate that over-implanting nitrogen as electron donors before starting graphitization helps stabilize the charge environment of the shallow NV center ensembles. By controlling the nitrogen ion implantation dose, we optimized charge state stability under photoionization and prepared high-quality NV center ensemble samples in HPHT diamonds at the optimal implantation dose range of 2×1013–8×1013 ions/cm2. This method, which relies solely on nitrogen ion implantation and annealing on HPHT diamond, significantly reduces the cost of sensor samples, greatly benefiting the promotion of quantum sensing.
Article Details
Journal Info
Applied Physics Letters
American Institute of Physics
Authors (12)
Qin Wu
Die Fang
School of Physics and School of Microelectronic, Hefei University of Technology 1 , Hefei, Anhui 230009,
Yu Ma
Yi Zhu
Xiaoli Dai
School of Physics and School of Microelectronic, Hefei University of Technology 1 , Hefei, Anhui 230009,
Yaoguo Gao
School of Physics and School of Microelectronic, Hefei University of Technology 1 , Hefei, Anhui 230009,
Shansi Dong
Department of Computer Science, Illinois Institute of Technology 2 , Chicago, Illinois 60616,
Zhifei Yu
School of Physics, Hefei University of Technology 1 , Hefei, Anhui 230009,
Peng Qian
School of Physics and School of Microelectronic, Hefei University of Technology 1 , Hefei, Anhui 230009,
Jianpei Geng
School of Physics and School of Microelectronic, Hefei University of Technology 1 , Hefei, Anhui 230009,
Jing-Wei Fan
School of Physics and School of Microelectronic, Hefei University of Technology 1 , Hefei, Anhui 230009,
Bing Chen