Dopant vs free carrier concentrations in InAs/GaAs semiconductor quantum dots

J J. Brubach (Department of Materials Science & Engineering, University of Michigan 1 , Ann Arbor, Michigan 48109,) T T.-Y. Huang (Department of Materials Science & Engineering, University of Michigan 1 , Ann Arbor, Michigan 48109,) T T. Borrely (Department of Physics, University of Michigan 3 , Ann Arbor, Michigan 48109,) C C. Greenhill (Department of Materials Science & Engineering, University of Michigan 1 , Ann Arbor, Michigan 48109,) J J. Walrath (Department of Physics, University of Michigan 3 , Ann Arbor, Michigan 48109,) G G. Fedele (Department of Materials Science & Engineering, University of Michigan 1 , Ann Arbor, Michigan 48109,) Y Y.-C. Yang (Department of Materials Science & Engineering, University of Michigan 1 , Ann Arbor, Michigan 48109,) A A. Zimmerman (Department of Materials Science & Engineering, University of Michigan 1 , Ann Arbor, Michigan 48109,) R R. S. Goldman

Abstract

Semiconductor quantum dots (QDs) are nanostructures that can enhance the performance of electronic devices due to their 3D quantization. Typically, heterovalent impurities, or dopants, are added to semiconducting QDs to provide extra electrons and improve conductivity. Since each QD is expected to contain a few dopants, the extra electrons and their parent dopants have been difficult to locate. In this work, we investigate the spatial distribution of the extra electrons and their parent donors in epitaxial InAs/GaAs QDs using local-electrode atom-probe tomography and self-consistent Schrödinger–Poisson simulations in the effective mass approximation. Although dopants are provided in both layers, the ionized donors primarily reside outside of the QDs, providing extra electrons that are contained within the QDs. Indeed, due to the quantum confinement-induced enhancement of the donor ionization energy within the QDs, a lower fraction of dopants within the QDs are ionized. These findings suggest a pathway toward the development of 3D modulation-doped nanostructures.

Article Details

Volume / Issue Vol. 126, Issue 11
Published March 01, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (9)

J

J. Brubach

Department of Materials Science & Engineering, University of Michigan 1 , Ann Arbor, Michigan 48109,

T

T.-Y. Huang

Department of Materials Science & Engineering, University of Michigan 1 , Ann Arbor, Michigan 48109,

T

T. Borrely

Department of Physics, University of Michigan 3 , Ann Arbor, Michigan 48109,

C

C. Greenhill

Department of Materials Science & Engineering, University of Michigan 1 , Ann Arbor, Michigan 48109,

J

J. Walrath

Department of Physics, University of Michigan 3 , Ann Arbor, Michigan 48109,

G

G. Fedele

Department of Materials Science & Engineering, University of Michigan 1 , Ann Arbor, Michigan 48109,

Y

Y.-C. Yang

Department of Materials Science & Engineering, University of Michigan 1 , Ann Arbor, Michigan 48109,

A

A. Zimmerman

Department of Materials Science & Engineering, University of Michigan 1 , Ann Arbor, Michigan 48109,

R

R. S. Goldman