Dilute bismuth incorporated InGaBiAs photodetectors for extended short-wave infrared detection

M Md Toriqul Islam (Department of Electrical and Computer Engineering, University of Delaware 1 , Newark, Delaware 19716,) M Mrudul S. Parasnis (Department of Material Science and Engineering, University of Delaware 2 , Newark, Delaware 19716,) N Nuha Ahmed-Babikir (Department of Electrical and Computer Engineering, University of Delaware 1 , Newark, Delaware 19716,) J James Bork (Department of Material Science and Engineering, University of Delaware 2 , Newark, Delaware 19716,) A Abhilasha Kamboj (Department of Electrical and Computer Engineering, University of Delaware 1 , Newark, Delaware 19716,) S Sheikh Alimur Razi (Department of Electrical and Computer Engineering, University of Delaware 1 , Newark, Delaware 19716,) W Weipeng Wu (Department of Physics and Astronomy, University of Delaware 3 , Newark, Delaware 19716,) L Lars Gundlach (Department of Physics and Astronomy, University of Delaware 3 , Newark, Delaware 19716,) J Joshua M. O. Zide (Department of Materials Science and Engineering) J Jamie D. Phillips (Department of Electrical and Computer Engineering, University of Delaware 1 , Newark, Delaware 19716,)

Abstract

Dilute bismuth (Bi) incorporated InGaBiAs is a promising material for an extended range of short-wave infrared (e-SWIR, 1.7–2.5 μm wavelength) detection. The InGaBiAs is a highly mismatched semiconductor alloy, where small concentrations of Bi incorporation alter the electronic band structure due to the valence band anti-crossing interaction between Bi states and host InGaAs material, resulting in a decrease in the bandgap energy. In this work, photodetectors based on InGaBiAs alloys lattice matched to InP demonstrate an extension of the cutoff wavelength beyond 2 μm. Dark current density, minority carrier lifetime, and responsivity strongly depend on group-V arsenic overpressure during epitaxial growth. Photodetectors grown under high arsenic flux pressure show low dark current values at room temperature (1.0 × 10−3 A/cm2 at 100 mV reverse bias), an order of magnitude lower than stoichiometric and low As flux grown devices, and correspondingly higher lifetime and responsivity. Two distinct activation energies were identified for each growth condition based on temperature-dependent dark current analysis, with trap-assisted generation-recombination in the depletion region and shallow defect recombination as the dark current-limiting factors in all devices.

Article Details

Volume / Issue Vol. 127, Issue 1
Published July 07, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (10)

M

Md Toriqul Islam

Department of Electrical and Computer Engineering, University of Delaware 1 , Newark, Delaware 19716,

M

Mrudul S. Parasnis

Department of Material Science and Engineering, University of Delaware 2 , Newark, Delaware 19716,

N

Nuha Ahmed-Babikir

Department of Electrical and Computer Engineering, University of Delaware 1 , Newark, Delaware 19716,

J

James Bork

Department of Material Science and Engineering, University of Delaware 2 , Newark, Delaware 19716,

A

Abhilasha Kamboj

Department of Electrical and Computer Engineering, University of Delaware 1 , Newark, Delaware 19716,

S

Sheikh Alimur Razi

Department of Electrical and Computer Engineering, University of Delaware 1 , Newark, Delaware 19716,

W

Weipeng Wu

Department of Physics and Astronomy, University of Delaware 3 , Newark, Delaware 19716,

L

Lars Gundlach

Department of Physics and Astronomy, University of Delaware 3 , Newark, Delaware 19716,

J

Joshua M. O. Zide

Department of Materials Science and Engineering

J

Jamie D. Phillips

Department of Electrical and Computer Engineering, University of Delaware 1 , Newark, Delaware 19716,