Cryogenic performance of field-effect transistors and amplifiers based on selective area grown InAs nanowires

G Giulia Meucci (Department of Energy Conversion and Storage, Technical University of Denmark 1 , 2800 Kongens Lyngby,) D Dāgs Olšteins (Department of Energy Conversion and Storage, Technical University of Denmark 1 , 2800 Kongens Lyngby,) D Damon J. Carrad (Department of Energy Conversion and Storage, Technical University of Denmark 1 , 2800 Kongens Lyngby,) G Gunjan Nagda (Department of Energy Conversion and Storage, Technical University of Denmark 1 , 2800 Kongens Lyngby,) D Daria V. Beznasyuk (Department of Energy Conversion and Storage, Technical University of Denmark 1 , 2800 Kongens Lyngby,) C Christian E. N. Petersen (Department of Energy Conversion and Storage, Technical University of Denmark 1 , 2800 Kongens Lyngby,) S Sara Martí-Sánchez (Catalan Institute of Nanoscience and Nanotechnology (ICN2), CSIC and BIST 2 , Campus UAB, Bellaterra, Barcelona, Catalonia,) J Jordi Arbiol (Catalan Institute of Nanoscience and Nanotechnology − ICN2 (CSIC and BIST), Campus UAB, Bellaterra, Barcelona, Catalonia 08193, Spain) T Thomas Sand Jespersen (Department of Energy Conversion and Storage, Technical University of Denmark 1 , 2800 Kongens Lyngby,)

Abstract

Indium-arsenide nanowire field-effect transistors (NWFETs) are promising platforms for high-speed, low-power nanoelectronics operating at cryogenic conditions, relevant for quantum information processing. We use selective area growth of nanowires to realize scalable and planar nanowire device geometries that are compatible with standard semiconductor processing techniques. NWFETs are fabricated, and their low temperature characteristics, including ION/IOFF ratios, threshold voltages, sub-threshold slope, interfacial trap density, hysteresis, and mobility, are characterized. The NWFETs operate effectively in integrated circuitry relying on saturation-mode operation. In sub-threshold applications such as amplifiers, we find bandwidths exceeding our cryostat wiring, but the gate hysteresis presents challenges for precise tuning of the amplifier operating point. We discuss the role of crystal imperfections and fabrication processes on the transistor characteristics and propose strategies for further improvements.

Article Details

Volume / Issue Vol. 127, Issue 19
Published November 10, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (9)

G

Giulia Meucci

Department of Energy Conversion and Storage, Technical University of Denmark 1 , 2800 Kongens Lyngby,

D

Dāgs Olšteins

Department of Energy Conversion and Storage, Technical University of Denmark 1 , 2800 Kongens Lyngby,

D

Damon J. Carrad

Department of Energy Conversion and Storage, Technical University of Denmark 1 , 2800 Kongens Lyngby,

G

Gunjan Nagda

Department of Energy Conversion and Storage, Technical University of Denmark 1 , 2800 Kongens Lyngby,

D

Daria V. Beznasyuk

Department of Energy Conversion and Storage, Technical University of Denmark 1 , 2800 Kongens Lyngby,

C

Christian E. N. Petersen

Department of Energy Conversion and Storage, Technical University of Denmark 1 , 2800 Kongens Lyngby,

S

Sara Martí-Sánchez

Catalan Institute of Nanoscience and Nanotechnology (ICN2), CSIC and BIST 2 , Campus UAB, Bellaterra, Barcelona, Catalonia,

J

Jordi Arbiol

Catalan Institute of Nanoscience and Nanotechnology − ICN2 (CSIC and BIST), Campus UAB, Bellaterra, Barcelona, Catalonia 08193, Spain

T

Thomas Sand Jespersen

Department of Energy Conversion and Storage, Technical University of Denmark 1 , 2800 Kongens Lyngby,