Correlation between microstructural changes and phonon shifts in O−-implanted FeS2 thin films

R Rudra Narayan Chakraborty (Department of Physics, National Institute of Technology Meghalaya , Sohra 793108,) D Dipta Suryya Mahanta (Department of Physics, National Institute of Technology Meghalaya , Sohra 793108,) K Kasilingam Senthilkumar (Department of Physics, National Institute of Technology Meghalaya , Sohra 793108,)

Abstract

This work systematically studies microstructural modifications in FeS2 thin films induced by low-energy oxygen implantation at different fluences. Crystallite size was determined from x-ray diffraction (XRD), while phonon shifts in the Ag Raman vibrational mode were analyzed for all samples. A clear correlation was established between Raman shift, crystallite size, and ion fluence. This approach highlights Raman scattering as a rapid, nondestructive, and complementary alternative to XRD, with significant implications for in situ monitoring of implantation processes. The results provide a robust foundation for linking implantation parameters to structural evolution and phonon behavior of ion-implanted FeS2 thin films.

Article Details

Volume / Issue Vol. 127, Issue 26
Published December 29, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (3)

R

Rudra Narayan Chakraborty

Department of Physics, National Institute of Technology Meghalaya , Sohra 793108,

D

Dipta Suryya Mahanta

Department of Physics, National Institute of Technology Meghalaya , Sohra 793108,

K

Kasilingam Senthilkumar

Department of Physics, National Institute of Technology Meghalaya , Sohra 793108,