Carbon in GaN as a nonradiative recombination center

F Fangzhou Zhao (Department of Chemistry, McGill University, 801 Sherbrooke Street. W, Montreal, Quebec H3A0B8, Canada) H Hongyi Guan (Materials Department, University of California 1 , Santa Barbara, California 93106-5050,) M Mark E. Turiansky (Department of Materials) C Chris G. Van de Walle (Materials Department, University of California Santa Barbara , Santa Barbara, California 93106,)

Abstract

Trap-assisted nonradiative recombination has been shown to limit the efficiency of optoelectronic devices. While substitutional carbon (CN) has been suggested to be a nonradiative recombination center in GaN devices, a complete recombination cycle including the two charge-state transition levels has not been previously described. In this work, we investigate the trap-assisted recombination process due to CN in GaN, including multiphonon emission, radiative recombination, trap-assisted Auger–Meitner (TAAM) recombination as well as thermal emission of holes. Our study shows the key role of TAAM processes at the high carrier densities relevant for devices. We also reveal the carrier-density regimes where thermal emission and radiative recombination are expected to play an observable role. Our results highlight that carbon concentrations exceeding ∼1017 cm−3 can have a noticeable impact on device efficiency, not just in GaN active layers but also in InGaN and AlGaN. Our comprehensive formalism not only offers detailed results for carbon but also provides a general framework for assessing the multiple processes that participate in trap-assisted recombination in semiconductors.

Article Details

Volume / Issue Vol. 126, Issue 20
Published May 19, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (4)

F

Fangzhou Zhao

Department of Chemistry, McGill University, 801 Sherbrooke Street. W, Montreal, Quebec H3A0B8, Canada

H

Hongyi Guan

Materials Department, University of California 1 , Santa Barbara, California 93106-5050,

M

Mark E. Turiansky

Department of Materials

C

Chris G. Van de Walle

Materials Department, University of California Santa Barbara , Santa Barbara, California 93106,