Beyond a single mechanism: Uncovering the dual origin of degradation in <b> <i>β</i> </b> -Ga2O3 SBDs under forward bias stress

Y Yingzhe Wang X Xuefeng Zheng (State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, National Engineering Research Center of Wide Band-gap Semiconductor, School of Microelectronics, Xidian University 2 , Xi'an 710071,) S Sijie Bu (State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , Xi'an 710071,) T Tan Wang (School of Materials Science and Engineering Tongji University Shanghai 201804 P.R. China) K Kang Li (Guangdong Provincial Key Laboratory of Insect Developmental Biology and Applied Technology, Institute of Insect Science and Technology, School of Life Sciences, South China Normal University) M Man Hoi Wong (SEMATECH 2 , Albany, New York 12203,) L Lixin Guo X Xiaohua Ma Y Yue Hao

Abstract

This study delineated the degradation of β-Ga2O3 Schottky barrier diodes under forward bias stress and identified the physical cause of performance instability in these diodes. Stress was found to increase the reverse leakage current and the forward current under low biases and decrease the turn-on voltage. The values of these parameters were partially recovered after annealing. The increased noise power spectral density after stress application was completely recovered after annealing, indicating that device degradation caused by interface defects is reversible. From the temperature-dependent low-frequency noise results, the interface defect energy levels were determined to be about EC −0.35 eV (EC = conduction band minimum). Deep-level transient spectroscopy technology traced the remaining irreversible degradation to E2* bulk defects. This dual-mechanism framework provides a clear physical explanation of degradation and offers crucial insights for enhancing the long-term stability of Ga2O3 power devices.

Article Details

Volume / Issue Vol. 128, Issue 12
Published March 23, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (9)

Y

Yingzhe Wang

X

Xuefeng Zheng

State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, National Engineering Research Center of Wide Band-gap Semiconductor, School of Microelectronics, Xidian University 2 , Xi'an 710071,

S

Sijie Bu

State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , Xi'an 710071,

T

Tan Wang

School of Materials Science and Engineering Tongji University Shanghai 201804 P.R. China

K

Kang Li

Guangdong Provincial Key Laboratory of Insect Developmental Biology and Applied Technology, Institute of Insect Science and Technology, School of Life Sciences, South China Normal University

M

Man Hoi Wong

SEMATECH 2 , Albany, New York 12203,

L

Lixin Guo

X

Xiaohua Ma

Y

Yue Hao