Anomalous dynamic on-resistance instability mechanisms of p-GaN gate AlGaN/GaN HEMTs under power cycling tests

C Chengbing Pan (Tianjin Key Laboratory of Intelligent Control of Electrical Equipment, Tiangong University 2 , Tianjin 300387,) R Ruomeng Zhang (Yongjiang Laboratory 2 , Ningbo 315202,) X Xueyan Li (Key Laboratory of Bio-Inspired Smart Interfacial Science and Technology of Ministry of Education, School of Chemistry, Beihang University, Beijing 100191, China) Y Yibo Ning (The School of Control Science and Engineering, Tiangong University 1 , Tianjin 300387,) W Wenbo Wang L Lixia Zhao (State Key Laboratory of Environmental Chemistry and Eco-toxicology, Research Center for Eco-environmental Sciences)

Abstract

In this study, the instability mechanisms of dynamic on-resistance (RDSON) of p-GaN gate AlGaN/GaN high electron mobility transistors (HEMTs) were investigated under power cycling tests (PCTs). An anomalous dynamic RDSON instability behavior was observed, with an obvious decrease of 17.8% in the first stage (≤30k-cycle PCT), followed by a slight increase of 8.6%. The deep-level transient spectroscopy results show that the electron trap concentration in the AlGaN/GaN region and the hole trap concentration in the p-GaN layer decreased in the first stage, and then increased with increasing stress time. In addition, a new hole trap appeared in the AlGaN/GaN region after the 30k-cycle PCT. The decreased concentrations of the electron trap and hole trap below the gate increase the electrons in the two-dimensional electron gas in the first stage, reducing the dynamic RDSON. Afterward, the electron trapping enhances the depletion of the channel electrons and the increased hole trap concentration causes net negative charges under the gate, increasing the dynamic RDSON. This work provides important experimental evidence to understand the underlying mechanisms of the dynamic RDSON instability in p-GaN gate AlGaN/GaN HEMTs.

Article Details

Volume / Issue Vol. 128, Issue 7
Published February 16, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (6)

C

Chengbing Pan

Tianjin Key Laboratory of Intelligent Control of Electrical Equipment, Tiangong University 2 , Tianjin 300387,

R

Ruomeng Zhang

Yongjiang Laboratory 2 , Ningbo 315202,

X

Xueyan Li

Key Laboratory of Bio-Inspired Smart Interfacial Science and Technology of Ministry of Education, School of Chemistry, Beihang University, Beijing 100191, China

Y

Yibo Ning

The School of Control Science and Engineering, Tiangong University 1 , Tianjin 300387,

W

Wenbo Wang

L

Lixia Zhao

State Key Laboratory of Environmental Chemistry and Eco-toxicology, Research Center for Eco-environmental Sciences