An AlN/Al<i>x</i>Ga1-<i>x</i>N/GaN graded channel HEMT with enhanced power and linearity performance

X Xiang Du (School of Microelectronics, Xidian University 1 , Xi'an 710071,) M Min-Han Mi (School of Microelectronics, Xidian University 1 , Xi'an 710071,) P Peng-Fei Wang (Center of Nanomaterials for Renewable Energy, State Key Laboratory of Electrical Insulation and Power Equipment, School of Electrical Engineering) M Mao-Teng Lu (School of Microelectronics, Xidian University 1 , Xi'an 710071,) Y Yu-Wei Zhou (State Key Laboratory of Pharmaceutical Biotechnology and Jiangsu Key Laboratory for Molecular Medicine and Department of Neurology of Nanjing Drum Tower Hospital, Medical School of Nanjing University) C Can Gong (State Key Discipline Laboratory of Wide Bandgap Semiconductor Technology, Xidian University , Xi'an 710071,) X Xiao-Ping Ouyang (State Key Discipline Laboratory of Wide Bandgap Semiconductor Technology, Xidian University , Xi'an 710071,) X Xiao-Hua Ma (School of Microelectronics, Xidian University 1 , Xi'an 710071,) Y Yue Hao

Abstract

In this work, an AlN/AlxGa1-xN/GaN graded channel HEMT (AlN. GC HEMT) with enhanced power and linearity performance has been proposed. With the adoption of a strong-polarized AlN barrier and a graded AlxGa1-xN channel, a current density of 1806 mA/mm and a transconductance (Gm) gate voltage swing (GVS-Gm) of 7 V were gained. At 3.6 GHz load pull measurements with a drain voltage (VDS) of 8 V, the AlN. GC HEMT exhibited a maximum output power density (Pout) of 2.2 W/mm. Two-tone intermodulation distortion measurement further revealed an output third-order intercept point (OIP3) of 35.5 dBm and a corresponding linearity figure of merit (OIP3/PDC) of 11.2 dB. The improved performance can be attributed to the hybrid 2DEG and 3DEG distribution in the channel, where the high density 2DEG contributes to a large output capacity, and the smooth 3DEG facilitates a sustained and stable charge accumulation with bias variation. These results indicate the potential of AlN. GC HEMT in 5G applications that target high power density and high linearity.

Article Details

Volume / Issue Vol. 126, Issue 7
Published February 17, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (9)

X

Xiang Du

School of Microelectronics, Xidian University 1 , Xi'an 710071,

M

Min-Han Mi

School of Microelectronics, Xidian University 1 , Xi'an 710071,

P

Peng-Fei Wang

Center of Nanomaterials for Renewable Energy, State Key Laboratory of Electrical Insulation and Power Equipment, School of Electrical Engineering

M

Mao-Teng Lu

School of Microelectronics, Xidian University 1 , Xi'an 710071,

Y

Yu-Wei Zhou

State Key Laboratory of Pharmaceutical Biotechnology and Jiangsu Key Laboratory for Molecular Medicine and Department of Neurology of Nanjing Drum Tower Hospital, Medical School of Nanjing University

C

Can Gong

State Key Discipline Laboratory of Wide Bandgap Semiconductor Technology, Xidian University , Xi'an 710071,

X

Xiao-Ping Ouyang

State Key Discipline Laboratory of Wide Bandgap Semiconductor Technology, Xidian University , Xi'an 710071,

X

Xiao-Hua Ma

School of Microelectronics, Xidian University 1 , Xi'an 710071,

Y

Yue Hao