Afterpulsing suppression in 4H-SiC avalanche photodiodes by sub-bandgap photoexcitation

H Hong Song A Anqi Hu S Shifeng Zhang Y Yanling Ren (School of Electronic Engineering, State Key Laboratory of Information Photonics and Optical Communications, Beijing Key Laboratory of Work Safety Intelligent Monitoring, Beijing University of Posts and Telecommunications 1 , Beijing 100876,) X Xingye Zhou (National Key Laboratory of Solid-State Microwave Devices and Circuits, Hebei Semiconductor Research Institute 2 , Shijiazhuang 050051,) X Xia Guo (Shenzhen Campus of Sun Yat-sen University)

Abstract

Dark counts in silicon carbide avalanche photodiodes (SiC APDs) significantly limit their signal-to-noise ratio and overall performance, with afterpulsing being a major contributing factor. However, the specific correlation mechanisms between afterpulsing and trap states in SiC remain unclear, posing challenges for effective suppression. This work elucidates the influence mechanisms of shallow-level and deep-level traps on the temporal characteristics of afterpulsing in 4H-SiC APD. Based on these findings, we develop an innovative sub-bandgap optical excitation method that facilitates rapid carrier release from trap states, effectively reducing afterpulsing. This approach achieves a 37% reduction in afterpulsing probability without increasing the primary dark count rate. The proposed technique optimizes overall device performance by reducing dark count rate by 22% while maintaining high photon detection efficiency of 29% at 285 nm, ultimately improving the signal-to-noise ratio of the APDs.

Article Details

Volume / Issue Vol. 128, Issue 21
Published May 25, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (6)

H

Hong Song

A

Anqi Hu

S

Shifeng Zhang

Y

Yanling Ren

School of Electronic Engineering, State Key Laboratory of Information Photonics and Optical Communications, Beijing Key Laboratory of Work Safety Intelligent Monitoring, Beijing University of Posts and Telecommunications 1 , Beijing 100876,

X

Xingye Zhou

National Key Laboratory of Solid-State Microwave Devices and Circuits, Hebei Semiconductor Research Institute 2 , Shijiazhuang 050051,

X

Xia Guo

Shenzhen Campus of Sun Yat-sen University