Advanced characterization of density-of-states over wide bandgap-energy in p-type Cu2O TFTs by multiple-wavelength light source

S Soyeon Kim J Jaewook Yoo (Division of Electronic Engineering, Jeonbuk National University 1 , Jeonju-si 54896,) S Seongbin Lim (Division of Electronic Engineering, Jeonbuk National University 1 , Jeonju-si 54896,) H Hyeonjun Song (Department of Electronic Engineering, Jeonbuk National University 1 , Jeonju-si 54896,) H Hongseung Lee (Division of Electronic Engineering, Jeonbuk National University 1 , Jeonju-si 54896,) M Minah Park (Division of Electronic Engineering, Jeonbuk National University 1 , Jeonju-si 54896,) S Seohyeon Park (Division of Electronic Engineering, Jeonbuk National University 1 , Jeonju-si 54896,) S Sojin Jung (Division of Electronic Engineering, Jeonbuk National University 1 , Jeonju-si 54896,) G Gang Qiu P Peide D. Ye T Taewan Kim (Department of Chemistry) H Hagyoul Bae (Division of Electronic Engineering, Jeonbuk National University 1 , Jeonju-si 54896,)

Abstract

In this study, we fabricated thin-film transistors by depositing Cu2O through plasma-enhanced atomic layer deposition (3.6 k cycles), which has the advantages of enhanced chemical reactivity and improved crystal structure of thin films compared to conventional atomic layer deposition. We analyzed traps near the valence band using multi-wavelength light that extended up to the above bandgap, in conjunction with dark-state measured data. Using multi-wavelength light, we extracted traps dependent on the gate voltage. Traps with underestimated density due to limited detectability within the bandgap, dependent on the energy levels of the wavelengths, are filled with photons to extract the captured traps (holes). Our results reveal that the energy-dependent density peaks of VCu and VO, which strongly influence the p-type conduction mechanism, were observed in the trap density near the Fermi level using multiwavelength I–V photo-response. This study reports photo-responsive I–V measurements in aggressively scaled devices, crucial for instability and reliability assessments. Furthermore, trap extraction plays a critical role in the effective integration of n-type oxide semiconductors into CMOS technology, providing valuable insights into the performance analysis of applications.

Article Details

Volume / Issue Vol. 127, Issue 7
Published August 18, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (12)

S

Soyeon Kim

J

Jaewook Yoo

Division of Electronic Engineering, Jeonbuk National University 1 , Jeonju-si 54896,

S

Seongbin Lim

Division of Electronic Engineering, Jeonbuk National University 1 , Jeonju-si 54896,

H

Hyeonjun Song

Department of Electronic Engineering, Jeonbuk National University 1 , Jeonju-si 54896,

H

Hongseung Lee

Division of Electronic Engineering, Jeonbuk National University 1 , Jeonju-si 54896,

M

Minah Park

Division of Electronic Engineering, Jeonbuk National University 1 , Jeonju-si 54896,

S

Seohyeon Park

Division of Electronic Engineering, Jeonbuk National University 1 , Jeonju-si 54896,

S

Sojin Jung

Division of Electronic Engineering, Jeonbuk National University 1 , Jeonju-si 54896,

G

Gang Qiu

P

Peide D. Ye

T

Taewan Kim

Department of Chemistry

H

Hagyoul Bae

Division of Electronic Engineering, Jeonbuk National University 1 , Jeonju-si 54896,