Effect of C2H2F4/CF4O with low global warming potentials on SiNx etching as a CHF3 replacement
K
Kyung Lim Kim
J
Jong Woo Hong
Y
Young Woo Jeon
J
Jun Won Jeong
C
Chan Ho Kim
H
Hyeong Joon Eoh
S
Sung Hyun Kim
J
Jong Soon Park
N
Nam Il Cho
J
Jung Hun Kwak
Y
Yongil Kim
G
Geun Young Yeom
Article Details
Journal
Scientific Reports
Volume / Issue
Vol. 15, Issue 1
Published
November 18, 2025
ISSN
2045-2322
Publisher
Nature Portfolio
Authors (12)
K
Kyung Lim Kim
J
Jong Woo Hong
Y
Young Woo Jeon
J
Jun Won Jeong
C
Chan Ho Kim
H
Hyeong Joon Eoh
S
Sung Hyun Kim
J
Jong Soon Park
N
Nam Il Cho
J
Jung Hun Kwak
Y
Yongil Kim
G
Geun Young Yeom
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