Kim, K. L., Hong, J. W., Jeon, Y. W., Jeong, J. W., Kim, C. H., Eoh, H. J., Kim, S. H., Park, J. S., Cho, N. I., Kwak, J. H., Kim, Y., Yeom, G. Y. (2025). Effect of C2H2F4/CF4O with low global warming potentials on SiNx etching as a CHF3 replacement. Scientific Reports. https://doi.org/10.1038/s41598-025-24378-w