Cycloalkyl Ligand-Engineered Zirconium–Oxo Clusters for Sub-9 nm Electron Beam Lithography with Ultralow Line Edge Roughness
Article Details
Journal Info
Journal of the American Chemical Society
American Chemical Society
Authors (10)
Min Zhang
Wenzheng Li
State Key Laboratory of Fine Chemicals, Frontiers Science Center for Smart Materials, School of Chemical Engineering
Zihan Lian
State Key Laboratory of Fine Chemicals, Frontiers Science Center for Smart Materials, School of Chemical Engineering
Zijian Chen
State Key Laboratory of Fine Chemicals, Frontiers Science Center for Smart Materials, School of Chemical Engineering
Daohan Wang
State Key Laboratory of Fine Chemicals, Frontiers Science Center for Smart Materials, School of Chemical Engineering
Xiaofeng Gong
State Key Laboratory of Fine Chemicals, Frontiers Science Center for Smart Materials, School of Chemical Engineering
Jun Zhao
Department of Thoracic Oncology Beijing Cancer Hospital Beijing China
Huie Zhu
Zhangjiang Laboratory, 100 Haike Road, Pudong New Area, Shanghai 201210, P. R. China
Pengzhong Chen
State Key Laboratory of Fine Chemicals, Frontiers Science Center for Smart Materials, School of Chemical Engineering
Xiaojun Peng
Dalian University of Technology , , 2 Linggong Road , ,