Min Zhang, Wenzheng Li, Zihan Lian, Zijian Chen, Daohan Wang, Xiaofeng Gong, Jun Zhao, Huie Zhu, Pengzhong Chen, Xiaojun Peng. "Cycloalkyl Ligand-Engineered Zirconium–Oxo Clusters for Sub-9 nm Electron Beam Lithography with Ultralow Line Edge Roughness." Journal of the American Chemical Society, 2026. doi:10.1021/jacs.6c03438