Wafer-scale high-κ HfO2 dielectric films with sub-5-Å equivalent oxide thickness for 2D MoS2 transistors

S Songge Zhang T Tao Zhang H Hua Yu T Tong Li X Xiuzhen Li C Chenyang Cui Y Yuchao Zhou H Hailing Guo S Shuopei Wang D Dongfeng Zheng L Liangfeng Huang (Shanghai Key Laboratory of Anesthesiology and Brain Functional Modulation, Clinical Research Center for Anesthesiology and Perioperative Medicine, Translational Research Institute of Brain and Brain-Like Intelligence, Department of Anesthesiology and Perioperative medicine, Shanghai Fourth People’s Hospital, School of Medicine, Tongji University) L Liqi Bai S Su Liu C Cheng Shen W Wei Yang L Luojun Du D Dongxia Shi L Lede Xian X Xiaoming Tao Y Yang Chai N Na Li G Guangyu Zhang

Article Details

Volume / Issue Vol. 17, Issue 1
Published January 20, 2026
ISSN 2041-1723
Publisher Nature Portfolio

Journal Info

Nature Communications

Nature Portfolio

ISSN: 2041-1723 Open Access Life Sciences

Authors (22)

S

Songge Zhang

T

Tao Zhang

H

Hua Yu

T

Tong Li

X

Xiuzhen Li

C

Chenyang Cui

Y

Yuchao Zhou

H

Hailing Guo

S

Shuopei Wang

D

Dongfeng Zheng

L

Liangfeng Huang

Shanghai Key Laboratory of Anesthesiology and Brain Functional Modulation, Clinical Research Center for Anesthesiology and Perioperative Medicine, Translational Research Institute of Brain and Brain-Like Intelligence, Department of Anesthesiology and Perioperative medicine, Shanghai Fourth People’s Hospital, School of Medicine, Tongji University

L

Liqi Bai

S

Su Liu

C

Cheng Shen

W

Wei Yang

L

Luojun Du

D

Dongxia Shi

L

Lede Xian

X

Xiaoming Tao

Y

Yang Chai

N

Na Li

G

Guangyu Zhang