Unimolecular decomposition of formic acid cation (HCOOH+): Theory and experiment

A A. Gloriod (Université Gustave Eiffel, COSYS/IMSE 1 , 5 Bd Descartes, 77454 Champs sur Marne,) A A. R. Milosavljević (Synchrotron SOLEIL 2 , Saint-Aubin, BP 48, F-91192 Gif-sur-Yvette Cedex,) A A. Bellili (Faculty of Chemistry, USTHB, Laboratory of Thermodynamics and Molecular Modeling 3 , BP32, El Alia, Bab Ezzouar, 16111 Algiers,) J J. Palaudoux (Sorbonne Université, CNRS, Laboratoire de Chimie Physique–Matière et Rayonnement, LCPMR 4 , 75005 Paris,) F F. Penent (Sorbonne Université, CNRS, Laboratoire de Chimie Physique–Matière et Rayonnement, LCPMR 4 , 75005 Paris,) R R. Dupuy (Sorbonne Université, CNRS, Laboratoire de Chimie Physique–Matière et Rayonnement, LCPMR 4 , 75005 Paris,) M M. Hochlaf (Université Gustave Eiffel, COSYS/IMSE 1 , 5 Bd Descartes, 77454 Champs sur Marne,)

Abstract

The unimolecular decomposition of formic acid, FA, upon single-photon ionization is investigated by means of synchrotron radiation coupled to a photoelectron/Auger electron–photoion coincidence setup, allowing to identify the ionic products coming from state-to-state fragmentation upon ionization. We show that the C–O bond breaking and the proton ejection from ionized FA are the major processes, whereas H2O+ formation is a minor channel. For interpretation, we performed theoretical computations using post-Hartree–Fock ab initio computations to determine the neutral and ionic species formed during these experiments and the corresponding dissociation channels. We also mapped the potential energy surfaces of FA+ of doublet and quartet electronic states and its isomers along the reactive coordinates. Computations reveal that the major products are HCO+ or COH+ and HOCO+ or HCO2+ isomeric forms, depending on the initially populated parent cationic electronic state. Dissociation proceeds either directly or after intramolecular isomerization processes, via the HOCOH+ or H2OCO+ isomers. We also highlighted the importance of vibronic and spin–orbit couplings during these processes.

Article Details

Volume / Issue Vol. 164, Issue 17
Published May 07, 2026
ISSN 0021-9606
Publisher American Institute of Physics

Journal Info

The Journal of Chemical Physics

American Institute of Physics

ISSN: 0021-9606 Physical Sciences

Authors (7)

A

A. Gloriod

Université Gustave Eiffel, COSYS/IMSE 1 , 5 Bd Descartes, 77454 Champs sur Marne,

A

A. R. Milosavljević

Synchrotron SOLEIL 2 , Saint-Aubin, BP 48, F-91192 Gif-sur-Yvette Cedex,

A

A. Bellili

Faculty of Chemistry, USTHB, Laboratory of Thermodynamics and Molecular Modeling 3 , BP32, El Alia, Bab Ezzouar, 16111 Algiers,

J

J. Palaudoux

Sorbonne Université, CNRS, Laboratoire de Chimie Physique–Matière et Rayonnement, LCPMR 4 , 75005 Paris,

F

F. Penent

Sorbonne Université, CNRS, Laboratoire de Chimie Physique–Matière et Rayonnement, LCPMR 4 , 75005 Paris,

R

R. Dupuy

Sorbonne Université, CNRS, Laboratoire de Chimie Physique–Matière et Rayonnement, LCPMR 4 , 75005 Paris,

M

M. Hochlaf

Université Gustave Eiffel, COSYS/IMSE 1 , 5 Bd Descartes, 77454 Champs sur Marne,