Two-temperature model for predicting heating and melting in metallic and semiconductor materials irradiated by x-ray pulses

Abstract

The interaction of x-ray pulses with metallic and semiconductor materials has a wide range of applications in defense, nuclear fusion, and material processing. As such, thermal analysis of x-ray interactions with materials is crucial, particularly for ultrashort and short pulses (ranging from femtoseconds to a few nanoseconds). Similar to optical lasers, pulsed x rays can induce melting, evaporation, and ablation of materials through various physical mechanisms. A two-temperature model (TTM) is developed and applied to investigate the effects of soft x rays on the heating, melting, and ablation of metallic and semiconductor materials, which are commonly used in spacecraft solar cells, fusion devices, and high-energy physics applications. This model is particularly suited for analyzing these processes at very short time scales. The applicability of TTM for x-ray pulses lasting a few nanoseconds is also explored. The results are validated against the experimental data, offering valuable insights into the electron-lattice dynamics in metals and semiconductors during and after exposure to x-ray pulses.