Tuning Surface Concentrations of Building Units to Enable the Cathodic Deposition of Metastable ZIF‐L Films for Gas Separations

S Sijie Xie (Department of Materials Engineering KU Leuven Kasteelpark Arenberg 44, bus 2450 Heverlee B‐3001 Belgium) X Xiaoyu Tan N Nicolas Chanut (Division cMACS Faculty of Bioscience Engineering KU Leuven Celestijnenlaan 200F Leuven B‐3001 Belgium) Z Zhenyu Zhou W Wouter Monens (Department of Materials Engineering KU Leuven Kasteelpark Arenberg 44, bus 2450 Heverlee B‐3001 Belgium) X Xueliang Zhang H Hongwei Pan (Key Laboratory for Colloid and Interface Chemistry Ministry of Education School of Chemistry and Chemical Engineering Shandong University Jinan 250100 China) H Hui Pan (State Key Laboratory of Organometallic Chemistry, Shanghai Institute of Organic Chemistry, University of Chinese Academy of Sciences, Shanghai 200032, China) X Xuan Zhang I Ivo F. J. Vankelecom (Division cMACS Faculty of Bioscience Engineering KU Leuven Celestijnenlaan 200F Leuven B‐3001 Belgium) J Jan Fransaer (Department of Materials Engineering KU Leuven Kasteelpark Arenberg 44, bus 2450 Heverlee B‐3001 Belgium)

Abstract

AbstractCathodic deposition is an emerging technique for the preparation of metal–organic framework (MOF) films. However, monitoring and controlling the concentrations of MOF building units (i.e., metal nodes and ligands) on the electrode surface remains challenging and has yet to be reported. This limitation greatly hinders the application of this technique to the synthesis of MOFs sensitive to building unit concentrations, such as the well‐known metastable ZIF‐L. Here, using the cathodic deposition of ZIF‐L films as an example, we demonstrate how the surface metal node and ligand concentrations influence ZIF‐L film generation by utilizing in situ pH measurements and theoretical calculations. Also, we propose a strategy to regulate the concentrations of these building units, enabling the straightforward and rapid cathodic deposition of thin ZIF‐L films. With polydimethylsiloxane (PDMS) post‐modification, the electrochemically deposited ZIF‐L films on commercial anodized alumina oxide (AAO) substrate exhibit good gas separation performance, achieving a H2/N2 selectivity of 19.4 and a H2 permeance exceeding 360 GPU (1 GPU = 3.35 × 10−1⁰ mol m−2 s−1 Pa−1).

Article Details

Volume / Issue Vol. 64, Issue 43
Published October 20, 2025
ISSN 1433-7851
Publisher Wiley

Journal Info

Angewandte Chemie International Edition

Wiley

ISSN: 1433-7851 Physical Sciences

Authors (11)

S

Sijie Xie

Department of Materials Engineering KU Leuven Kasteelpark Arenberg 44, bus 2450 Heverlee B‐3001 Belgium

X

Xiaoyu Tan

N

Nicolas Chanut

Division cMACS Faculty of Bioscience Engineering KU Leuven Celestijnenlaan 200F Leuven B‐3001 Belgium

Z

Zhenyu Zhou

W

Wouter Monens

Department of Materials Engineering KU Leuven Kasteelpark Arenberg 44, bus 2450 Heverlee B‐3001 Belgium

X

Xueliang Zhang

H

Hongwei Pan

Key Laboratory for Colloid and Interface Chemistry Ministry of Education School of Chemistry and Chemical Engineering Shandong University Jinan 250100 China

H

Hui Pan

State Key Laboratory of Organometallic Chemistry, Shanghai Institute of Organic Chemistry, University of Chinese Academy of Sciences, Shanghai 200032, China

X

Xuan Zhang

I

Ivo F. J. Vankelecom

Division cMACS Faculty of Bioscience Engineering KU Leuven Celestijnenlaan 200F Leuven B‐3001 Belgium

J

Jan Fransaer

Department of Materials Engineering KU Leuven Kasteelpark Arenberg 44, bus 2450 Heverlee B‐3001 Belgium