Trade-off between Hall sensitivity, temperature stability, and frequency response in a 2DEG nitride Hall-effect sensor

S Satish Shetty (Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,) S Savannah R. Eisner (Department of Electrical Engineering, Columbia University 4 , New York, New York 10027,) A Ayesha Hassan (Department of Electrical Engineering, University of Arkansas 3 , Fayetteville, Arkansas 72701,) A Anand Lalwani (Department of Aeronautics and Astronautics, Stanford University 5 , Stanford, California 94305,) Y Yuriy I. Mazur (Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,) M Morgan E. Ware (Institute of Nano Science and Engineering, University of Arkansas 2 , Fayetteville, Arkansas 72701,) D Debbie G. Senesky (Department of Aeronautics and Astronautics, Stanford University 5 , Stanford, California 94305,) H H. Alan Mantooth (Department of Electrical Engineering, University of Arkansas 3 , Fayetteville, Arkansas 72701,) G Gregory J. Salamo (Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,)

Abstract

We investigated the relationship between Hall sensitivity, temperature stability, and frequency response of III-nitride two-dimensional electron gas-based Hall-effect sensors. For this study, we utilized three different heterostructure designs, each with varying percentages of “Al” content in the (Al)GaN barrier layer. The relationship among Hall sensitivity, temperature stability, and frequency response was investigated by varying the 2DEG carrier mobility, sheet density, and sheet resistance of the Hall device. The investigation demonstrated and explained a trade-off of Hall sensitivity of the order of 50% to obtain a sensor with a 16% reduction in sensitivity over the temperature range from room temperature to 377 °C with a frequency bandwidth of approximately 5.8 MHz. However, in terms of input voltage utilization, AlN/GaN retains its advantages, offering high sensitivity together with enhanced frequency response.

Article Details

Volume / Issue Vol. 139, Issue 1
Published January 07, 2026
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (9)

S

Satish Shetty

Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,

S

Savannah R. Eisner

Department of Electrical Engineering, Columbia University 4 , New York, New York 10027,

A

Ayesha Hassan

Department of Electrical Engineering, University of Arkansas 3 , Fayetteville, Arkansas 72701,

A

Anand Lalwani

Department of Aeronautics and Astronautics, Stanford University 5 , Stanford, California 94305,

Y

Yuriy I. Mazur

Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,

M

Morgan E. Ware

Institute of Nano Science and Engineering, University of Arkansas 2 , Fayetteville, Arkansas 72701,

D

Debbie G. Senesky

Department of Aeronautics and Astronautics, Stanford University 5 , Stanford, California 94305,

H

H. Alan Mantooth

Department of Electrical Engineering, University of Arkansas 3 , Fayetteville, Arkansas 72701,

G

Gregory J. Salamo

Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,