Thermodynamic discontinuity in evaporating thin solvated nematics

P Prateek Chowdhury (Department of Chemical Engineering & Technology, Indian Institute of Technology (BHU) , Varanasi, Uttar Pradesh 221005,) D Debdip Bhandary (Department of Chemical Engineering & Technology, Indian Institute of Technology (BHU) , Varanasi, Uttar Pradesh 221005,) A Abir Ghosh (Department of Chemical Engineering & Technology, Indian Institute of Technology (BHU) , Varanasi, Uttar Pradesh 221005,)

Abstract

Self-organized patterns of nematic liquid crystals (NLCs) are indispensable in sensing and opto-electronics due to their intricate molecular sensitivities. A molecular-scale investigation of solvated thin NLC films reveals that concurrent discontinuities in NLC–NLC interaction-driven thermodynamic properties, mobility, and rheological responses engender the incipient and necessary conditions for dewetting. This spontaneous dewetting is followed by self-organized morphological evolution, which proceeds through concentration-dependent distinct pathways. These discontinuities arise from an entropic landscape generated by a sufficient fraction of solvent molecules—an effect absent in pure thin NLC films, overcoming a long-standing challenge in achieving controlled self-organized patterns in such systems. The magnitude of these discontinuities governs film instability and the resulting morphological transitions with varying molecular orientations, consistent with the developed continuum-scale theory and previous experimental observations. This continuum framework, developed for the first time for solvated anisotropic systems, incorporates anisotropic contributions of NLC molecules derived from molecular-scale energetics and accurately recovers the characteristic pattern length scales in agreement with experiments. This enables the establishment of a multi-scale, unified framework, as deployed in this study, for solvent evaporation-induced nano/microfabrications.

Article Details

Volume / Issue Vol. 164, Issue 11
Published March 21, 2026
ISSN 0021-9606
Publisher American Institute of Physics

Journal Info

The Journal of Chemical Physics

American Institute of Physics

ISSN: 0021-9606 Physical Sciences

Authors (3)

P

Prateek Chowdhury

Department of Chemical Engineering & Technology, Indian Institute of Technology (BHU) , Varanasi, Uttar Pradesh 221005,

D

Debdip Bhandary

Department of Chemical Engineering & Technology, Indian Institute of Technology (BHU) , Varanasi, Uttar Pradesh 221005,

A

Abir Ghosh

Department of Chemical Engineering & Technology, Indian Institute of Technology (BHU) , Varanasi, Uttar Pradesh 221005,