Thermal transport in heavy-ion irradiated GaN: The effect of static and dynamic annealing

W Wujuan Yan (Department of Energy and Resources Engineering, Peking University 1 , Beijing 100871,) Y Yuanyuan Xue (Laboratory of Advanced Materials, State Key Laboratory of Porous Materials for Separation and Conversion, Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials) W Wenjiang Zhou (Department of Energy and Resources Engineering, Peking University 2 , Beijing 100871,) H Han Yang H Haichang Guo (Department of Energy and Resources Engineering, Peking University 1 , Beijing 100871,) Y Yuxi Wang K Kexin Zhang (State Key Laboratory of High Pressure and Superhard Materials, College of Physics) L Lili Ding (Princess Margaret Cancer Center) Z Zhizhong Chen X Xuelin Yang B Bo Shen (Department of Chemistry) W Wei Chen B Bai Song (College of Chemistry and Chemical Engineering)

Abstract

The suppression of thermal transport in semiconducting materials due to ion irradiation has recently garnered wide attention. In particular, heavy gold ions (Au2+) have been shown to induce ultralow thermal conductivity (κ) in gallium nitride (GaN), down to ∼1 W m−1 K−1 at room temperature (RT). Although the repairing effect of thermal annealing on various structural defects has long been recognized, the impact on thermal transport remains largely unexplored, especially for semiconductors irradiated by heavy ions. Here, we prepare Au2+-irradiated single-crystalline GaN samples under five different ion fluences from 1011 to 1015 cm−2 and investigate how κ varies with both static and dynamic annealing. Compared to the as-irradiated samples, κ consistently increases as the static annealing temperature rises from 573 to 773 K and then 973 K, up to about 50% (5.8 × 1011 cm−2 fluence) of the value for pristine GaN and a factor of 6 at intermediate fluences (5.8 × 1012 and 5.8 × 1013 cm−2). Moreover, the recovered κ is always smaller at higher fluences, suggesting an increasing number of defects that cannot be readily repaired. Upon dynamic annealing (5 × 1014 cm−2), κ first decreases from 1.4 (irradiation at RT) to 1.2 W m−1 K−1 (573 K) and then rises to 7.8 W m−1 K−1 (973 K). This non-monotonic trend is attributed to the varying competition between the generation and annihilation of lattice defects at different temperatures. These findings expand our understanding of how annealing changes thermal transport in heavy ion-irradiated semiconductors and may facilitate their applications in harsh environments with intense radiation and high temperatures.

Article Details

Volume / Issue Vol. 138, Issue 14
Published October 14, 2025
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (13)

W

Wujuan Yan

Department of Energy and Resources Engineering, Peking University 1 , Beijing 100871,

Y

Yuanyuan Xue

Laboratory of Advanced Materials, State Key Laboratory of Porous Materials for Separation and Conversion, Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials

W

Wenjiang Zhou

Department of Energy and Resources Engineering, Peking University 2 , Beijing 100871,

H

Han Yang

H

Haichang Guo

Department of Energy and Resources Engineering, Peking University 1 , Beijing 100871,

Y

Yuxi Wang

K

Kexin Zhang

State Key Laboratory of High Pressure and Superhard Materials, College of Physics

L

Lili Ding

Princess Margaret Cancer Center

Z

Zhizhong Chen

X

Xuelin Yang

B

Bo Shen

Department of Chemistry

W

Wei Chen

B

Bai Song

College of Chemistry and Chemical Engineering