Theory and computation of thermal-field emission from semiconductors

S Salvador Barranco Cárceles (School of Engineering, University of Edinburgh 1 , Edinburgh,) V Veronika Zadin (Institute of Technology, University of Tartu 3 , Tartu,) A Aquila Mavalankar (Adaptix Imaging Ltd. 2 , Oxford,) I Ian Underwood (School of Engineering, University of Edinburgh 1 , Edinburgh,) A Andreas Kyritsakis (Institute of Technology, University of Tartu 3 , Tartu,)

Abstract

Semiconducting field emitters present some interesting features (e.g., self-limited electron emission) for both scientific interest and industrial applications. The analysis of experimental results and device design has been restrained by the lack of accurate 3D models for the simulation of thermal-field emission from semiconductors. Here, we review and correct the equations of field emission from semiconductors and include them to expand GETELEC (General Tool for Electron Emission Calculations). Our method covers all electron emission regimes (field, thermal, and intermediate), aiming to maximize the calculation accuracy while minimizing the computational cost. GETELEC-2.0 is able to reproduce the characteristic non-linear I-V curves in Fowler–Nordheim coordinates obtained from semiconductors, giving insights about their nature, as well as providing an explanation to the lack of experimental observation of the field emitted valence band electrons from semiconductors.

Article Details

Volume / Issue Vol. 138, Issue 15
Published October 21, 2025
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (5)

S

Salvador Barranco Cárceles

School of Engineering, University of Edinburgh 1 , Edinburgh,

V

Veronika Zadin

Institute of Technology, University of Tartu 3 , Tartu,

A

Aquila Mavalankar

Adaptix Imaging Ltd. 2 , Oxford,

I

Ian Underwood

School of Engineering, University of Edinburgh 1 , Edinburgh,

A

Andreas Kyritsakis

Institute of Technology, University of Tartu 3 , Tartu,