Theoretical investigation of thermionic electron emission from semiconductors and insulators and mean escape probability of internal secondary electrons

X Xiang Li H Hong-Kun Lu (China National Software & Service Co., Ltd 2 , Beijing 102200,) A Ai-Gen Xie (School of Physics and Optoelectronic Engineering, Nanjing University of Information Science and Technology 1 , Nanjing 210044,) Y Yi-Kang Xu (School of Physics and Optoelectronic Engineering, Nanjing University of Information Science and Technology 1 , Nanjing 210044,) H Hao Feng L Lu Wang

Abstract

From the definitions of parameters of thermionic electron emission, theories of insulators and semiconductors (IS) and field emission, and those of the escape of electron-induced internal secondary electrons (EIISE), the formulas for j, G, EAve, and B of IS and semiconductors with high-density surface energy states (SHS) were deduced, respectively. Here, j, G, and EAve denote the current density, spectrum, and average energy of hot electrons, respectively; B is the average probability that a hot electron escapes into vacuum upon reaching the surface. The deduced formulas were analyzed and compared with existing results. It is concluded that the deduced formulas for j of IS and SHS are theoretically correct, and that the formulas for G, EAve, and B derived here can express those quantities for IS and SHS, respectively. From the definition of Bs and the fact that, when the absolute temperature in the formula for G is taken as a given value, the deduced G of IS can express the spectra of secondary electrons from IS, the formula for Bs and a more accurate method for calculating Bs were deduced and presented, respectively. Here, Bs denotes the mean escape probability of EIISE reaching the emission surface of IS. The method for calculating ΔQ using the formula for j of SHS derived here was presented, where ΔQ is the quantity of band bending due to high-density surface energy states of semiconductors. The two presented methods were analyzed, and it is concluded that they are correct.

Article Details

Volume / Issue Vol. 139, Issue 14
Published April 14, 2026
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (6)

X

Xiang Li

H

Hong-Kun Lu

China National Software & Service Co., Ltd 2 , Beijing 102200,

A

Ai-Gen Xie

School of Physics and Optoelectronic Engineering, Nanjing University of Information Science and Technology 1 , Nanjing 210044,

Y

Yi-Kang Xu

School of Physics and Optoelectronic Engineering, Nanjing University of Information Science and Technology 1 , Nanjing 210044,

H

Hao Feng

L

Lu Wang