The Impact of Copolymer Molecular Sequence on Electronic Transport

M Mahya Mehregan (Department of Chemistry University of Missouri Columbia Missouri USA) J Jack Shultz (Chemical and Biomedical Engineering University of Missouri Columbia Missouri USA) A Andreas Werbrouck (Materials Science and Engineering Institute University of Missouri Columbia Missouri USA) D Dilan M. Gamachchi (Department of Physics University of Missouri Columbia Missouri USA) I Indeewari M. Karunarathne (Department of Physics University of Missouri Columbia Missouri USA) M Matthew R. Maschmann (Materials Science and Engineering Institute University of Missouri Columbia Missouri USA) A Andrew C. Meng (Department of Physics University of Missouri Columbia Missouri USA) M Matthias J. Young (Department of Chemistry University of Missouri Columbia Missouri USA)

Abstract

ABSTRACT Established relationships describe how the energetics and spacing of polarons impact electronic transport in conjugated homo ‐polymers, yet no model exists extending these concepts to the growing field of sequence‐controlled co ‐polymers. This work employs oxidative molecular layer deposition (oMLD) to form thin films of sequence‐controlled copolymers of 3,4‐ethylenedioxythiophene (EDOT) and pyrrole (Py) and identifies that molecular sequence drives a three‐orders‐of‐magnitude change in conductivity at fixed composition. We extend Boltzmann hopping transport models for homopolymers to describe how electron energy well depth changes with EDOT and Py copolymer block lengths and separation distances. We measure a critical hopping distance of four monomer units (corresponding to ∼1.5 nm) and a critical polaron formation size of similar length. The model and conceptual insights we develop describe the electronic properties of sequence‐controlled copolymers and provide an upper length‐scale bound for molecular design of engineered organic nanomaterials.

Article Details

Volume / Issue Vol. 1, Issue 1
Published July 24, 2026
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (8)

M

Mahya Mehregan

Department of Chemistry University of Missouri Columbia Missouri USA

J

Jack Shultz

Chemical and Biomedical Engineering University of Missouri Columbia Missouri USA

A

Andreas Werbrouck

Materials Science and Engineering Institute University of Missouri Columbia Missouri USA

D

Dilan M. Gamachchi

Department of Physics University of Missouri Columbia Missouri USA

I

Indeewari M. Karunarathne

Department of Physics University of Missouri Columbia Missouri USA

M

Matthew R. Maschmann

Materials Science and Engineering Institute University of Missouri Columbia Missouri USA

A

Andrew C. Meng

Department of Physics University of Missouri Columbia Missouri USA

M

Matthias J. Young

Department of Chemistry University of Missouri Columbia Missouri USA