Synchrotron-radiation x-ray topography and reticulography of bulk β-Ga2O3 crystals grown by the cold crucible method

Y Yongzhao Yao (Mie University 1 , 1577 Kurimamachiya-cho, Tsu, Mie 514-8507,) K Koki Mizuno (1577 Kurimamachiya-cho 1 Innovation Center for Semiconductor and Digital Future, Mie University, , Tsu, Mie 514-8507,) K Kazuki Ohnishi (1577 Kurimamachiya-cho 1 Innovation Center for Semiconductor and Digital Future, Mie University, , Tsu, Mie 514-8507,) Y Yukari Ishikawa (Japan Fine Ceramics Center 2 , 2-4-1 Mutsuno, Atsuta, Nagoya 456-8587,) M Masanori Kitahara (C&A Corporation 3 , 1-16-23 Ichibanchho, Aoba-ku, Sendai, Miyagi 980-0811,) T Taketoshi Tomida (C&A Corporation 3 , 1-16-23 Ichibanchho, Aoba-ku, Sendai, Miyagi 980-0811,) R Rikito Murakami V Vladimir Kochurikhin (C&A Corporation 3 , 1-16-23 Ichibanchho, Aoba-ku, Sendai, Miyagi 980-0811,) L Liudmila Gushchina K Kei Kamada K Koichi Kakimoto (Institute for Materials Research, Tohoku University 4 , 2-1-1, Katahira, Aoba-ku, Sendai, Miyagi 980-8577,) A Akira Yoshikawa

Abstract

The structural properties of a β-Ga2O3 single crystal grown by the oxide crystal growth from cold crucible (OCCC) method were investigated using synchrotron radiation x-ray topography and x-ray reticulography. The region grown beneath the seed exhibits high crystalline quality with a rocking curve full width at half maximum of about 26 arc sec. During diameter enlargement, a twist-type lattice misorientation develops between the central and laterally expanded regions, originating near the shoulder and propagating along boundaries parallel to the 〈010〉 growth direction. Dislocation analysis reveals that 〈010〉-oriented screw dislocations dominate the defect structure with densities of ∼105 cm−2, while higher densities (∼106 cm−2) appear in the wing region (i.e., the laterally expanded region formed during diameter enlargement). These results clarify defect formation in OCCC-grown β-Ga2O3 and provide insights into optimizing growth conditions.

Article Details

Volume / Issue Vol. 139, Issue 20
Published May 28, 2026
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (12)

Y

Yongzhao Yao

Mie University 1 , 1577 Kurimamachiya-cho, Tsu, Mie 514-8507,

K

Koki Mizuno

1577 Kurimamachiya-cho 1 Innovation Center for Semiconductor and Digital Future, Mie University, , Tsu, Mie 514-8507,

K

Kazuki Ohnishi

1577 Kurimamachiya-cho 1 Innovation Center for Semiconductor and Digital Future, Mie University, , Tsu, Mie 514-8507,

Y

Yukari Ishikawa

Japan Fine Ceramics Center 2 , 2-4-1 Mutsuno, Atsuta, Nagoya 456-8587,

M

Masanori Kitahara

C&A Corporation 3 , 1-16-23 Ichibanchho, Aoba-ku, Sendai, Miyagi 980-0811,

T

Taketoshi Tomida

C&A Corporation 3 , 1-16-23 Ichibanchho, Aoba-ku, Sendai, Miyagi 980-0811,

R

Rikito Murakami

V

Vladimir Kochurikhin

C&A Corporation 3 , 1-16-23 Ichibanchho, Aoba-ku, Sendai, Miyagi 980-0811,

L

Liudmila Gushchina

K

Kei Kamada

K

Koichi Kakimoto

Institute for Materials Research, Tohoku University 4 , 2-1-1, Katahira, Aoba-ku, Sendai, Miyagi 980-8577,

A

Akira Yoshikawa