Structure, stress, and optical property correlations in nano-structured Mo/Si and W/B4C multilayer mirrors for hard x-ray applications

F Faiyaz Mollick (Accelerator Physics and Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced Technology 1 , Indore 452013,) M Maheswar Nayak (Accelerator Physics and Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced Technology 1 , Indore 452013,) A Ajay Kumar Kashyap (Accelerator Physics and Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced Technology 1 , Indore 452013,) J Jitendra Kumar A Arindam Majhi N Nageswararao Pothana (Accelerator Physics and Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced Technology 1 , Indore 452013,) P Parasmani Rajput (Homi Bhabha National Institute, Training School Complex 2 , Anushakti Nagar, Mumbai 400094,) M Manoj Kumar Tiwari (Accelerator Physics and Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced Technology 1 , Indore 452013,) S Sanjay Kumar Rai (Accelerator Physics and Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced Technology 1 , Indore 452013,) M Manvendra Narayan Singh (Accelerator Physics and Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced Technology 1 , Indore 452013,) A Archna Sagdeo

Abstract

The comprehensive structure, stress, and optical property correlation of high performance x-ray multilayer (ML) mirrors based on Mo/Si and W/B4C material systems is systematically investigated for hard x-ray applications in the 10–20 keV range. All MLs are deposited by magnetron sputtering with carefully tuned periodicities and number of layer pairs to optimize for either high photon flux or high spectral resolution. Structural properties are probed using x-ray reflectivity and diffuse scattering, while residual stress and crystallite characteristics of metallic layer are analyzed by grazing incidence x-ray diffraction. The Mo/Si MLs, with relatively large periods (∼6.53 and 9.43 nm), exhibit interlayer formation and demonstrate high reflectivity up to ∼92% along with very high integrated reflectivity, making them suitable for high-flux applications. In contrast, short and ultra-short period (∼3.74 and 1.85 nm) W/B4C MLs show sharp interfaces, supporting their use in high-resolution optics with relative energy resolution down to ∼1.2%.

Article Details

Volume / Issue Vol. 138, Issue 17
Published November 07, 2025
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (11)

F

Faiyaz Mollick

Accelerator Physics and Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced Technology 1 , Indore 452013,

M

Maheswar Nayak

Accelerator Physics and Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced Technology 1 , Indore 452013,

A

Ajay Kumar Kashyap

Accelerator Physics and Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced Technology 1 , Indore 452013,

J

Jitendra Kumar

A

Arindam Majhi

N

Nageswararao Pothana

Accelerator Physics and Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced Technology 1 , Indore 452013,

P

Parasmani Rajput

Homi Bhabha National Institute, Training School Complex 2 , Anushakti Nagar, Mumbai 400094,

M

Manoj Kumar Tiwari

Accelerator Physics and Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced Technology 1 , Indore 452013,

S

Sanjay Kumar Rai

Accelerator Physics and Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced Technology 1 , Indore 452013,

M

Manvendra Narayan Singh

Accelerator Physics and Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced Technology 1 , Indore 452013,

A

Archna Sagdeo