Stable Analog Weight Programming in Single‐Crystalline van der Waals Ferroelectric Transistors for Reliable Computing‐in‐Memory

M Mengjiao Li F Feng‐Shou Yang (Institute of Electronics Engineering National Tsing Hua University Hsinchu Taiwan) Y Yanan Liu C Chi Zhang E Enlong Li J Jingbo Yang C Che‐Yi Lin (Department of Physics National Chung Hsing University Taichung Taiwan) H Hefei Liu (2University of Pennsylvania, Radiation Oncology, Philadelphia, United States) C Chen Luo (College of Plant Protection, Yangzhou University) H Hsing‐Chicn Chien (Institute of Electronics Engineering National Tsing Hua University Hsinchu Taiwan) Y Yuan‐Ming Chang (Department of Physics National Chung Hsing University Taichung Taiwan) J Jan‐Chi Yang (Department of Physics National Cheng Kung University Tainan Taiwan) C Chang‐Hong Shen (College of Semiconductor Research National Tsing Hua University Hsinchu Taiwan) Y Yu‐Lun Chueh (Department of Materials Science and Engineering National Tsing Hua University Hsinchu Taiwan) J Jun Li J Jianhua Zhang J Jiunn‐Lin Wu (Department of Computer Science and Engineering National Chung Hsing University Taichung Taiwan) P Po‐Wen Chiu (Institute of Electronics Engineering National Tsing Hua University Hsinchu Taiwan) Y Yen‐Fu Lin (Department of Physics National Chung Hsing University Taichung Taiwan)

Abstract

ABSTRACT Emerging ferroelectric non‐volatile memories are revolutionizing von Neumann architectures by providing efficient hardware for both AI training and inference. However, as ferroelectric dimensions scale toward the nanoscale, reliable modulation is hindered by interfacial degradation and phase instability, leading to synaptic weight drift and computational inaccuracies. Here, a high‐performance ferroelectric‐van der Waals transistor (FeFET) for computing‐in‐memory by integrating a single‐crystalline Bi 2 O 2 Se (BOS) layer into a ferroelectric/MoS 2 heterostructure is demonstrated. The implementation of an asymmetrical capacitive stack ensures effective polarization‐charge compensation during fine‐state switching, achieving precise multi‐level weight programming with significantly suppressed carrier fluctuations. Fabricated through a low‐temperature process, the BOS‐based FeFET exhibits exceptional reliability, including 10‐year retention at 85°C, endurance exceeding 10 11 cycles, stable 32‐state analog switching with 0.9% retention variation over 10 000 s, and ultra‐low programming error. Atomically smooth heterointerfaces yield high spatial uniformity (7% variation) across the FeFET array, enabling a hardware neural network that achieves 98.5% accuracy in nonlinear classification. Furthermore, by incorporating intrinsic ferroelectric switching variance into the training phase, it is elucidated how device imperfections can be leveraged to reshape learning dynamics in pixel‐wise semantic segmentation. This work establishes a comprehensive co‐design methodology bridging advanced ferroelectric materials, device engineering, and algorithmic optimization for next‐generation neuromorphic computing.

Article Details

Volume / Issue Vol. 38, Issue 35
Published June 01, 2026
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (19)

M

Mengjiao Li

F

Feng‐Shou Yang

Institute of Electronics Engineering National Tsing Hua University Hsinchu Taiwan

Y

Yanan Liu

C

Chi Zhang

E

Enlong Li

J

Jingbo Yang

C

Che‐Yi Lin

Department of Physics National Chung Hsing University Taichung Taiwan

H

Hefei Liu

2University of Pennsylvania, Radiation Oncology, Philadelphia, United States

C

Chen Luo

College of Plant Protection, Yangzhou University

H

Hsing‐Chicn Chien

Institute of Electronics Engineering National Tsing Hua University Hsinchu Taiwan

Y

Yuan‐Ming Chang

Department of Physics National Chung Hsing University Taichung Taiwan

J

Jan‐Chi Yang

Department of Physics National Cheng Kung University Tainan Taiwan

C

Chang‐Hong Shen

College of Semiconductor Research National Tsing Hua University Hsinchu Taiwan

Y

Yu‐Lun Chueh

Department of Materials Science and Engineering National Tsing Hua University Hsinchu Taiwan

J

Jun Li

J

Jianhua Zhang

J

Jiunn‐Lin Wu

Department of Computer Science and Engineering National Chung Hsing University Taichung Taiwan

P

Po‐Wen Chiu

Institute of Electronics Engineering National Tsing Hua University Hsinchu Taiwan

Y

Yen‐Fu Lin

Department of Physics National Chung Hsing University Taichung Taiwan