Solvent‐Mediated Reactivity Control of Lewis‐Paired Dopants as a Versatile Strategy for Tunable and Stable Doping of Organic Semiconductors

S Sang Beom Kim (Department of Energy Engineering Hanyang University Seoul Republic of Korea) E Eui Hyun Suh (Department of Chemistry and Biochemistry) T Taek Seong Lee (Department of Energy Engineering Hanyang University Seoul Republic of Korea) A Andreas W. Erhardt I Iain McCulloch (Chemistry Research Laboratory, University of Oxford, 12 Mansfield Road, Oxford OX1 3TA, U.K.) J Jaeyoung Jang (Department of Energy Engineering Hanyang University Seoul Republic of Korea)

Abstract

ABSTRACT The Lewis pairing between existing dopant molecules offers great potential for developing new organic dopants with exceptional doping strength and stability. However, the high reactivity of Lewis‐paired dopants complicates doping‐level control, while the use of non‐orthogonal solvents can damage organic semiconductor (OSC) films, hindering device applications. Here, the dopant reactivity is controlled by regulating the association–dissociation kinetics among pairing dopants and solvent molecules, which are strongly influenced by solvent polarity. In highly polar solvents, Lewis acid–solvent adducts predominantly form, suppressing the generation of Lewis‐paired dopants. As solvent polarity decreases, the dissociation rate of the Lewis acid–solvent adduct increases, establishing a dynamic equilibrium between the Lewis acid and the solvent and thereby optimizing reactivity. Consequently, the optimally processed Lewis‐paired dopant enables efficient doping of various OSCs with finely tunable doping levels, simultaneously achieving a high thermoelectric power factor (170 µW m −1 K −2 ) and Seebeck coefficient (227 µV K −1 ). These performances surpass those of the conventional salt‐type FeCl 3 dopant and exhibit markedly improved doping stability under ambient and elevated‐temperature conditions. This study provides a practical strategy for utilizing Lewis‐paired dopants by elucidating their doping mechanisms, paving the way to overcome long‐standing limitations in OSC doping.

Article Details

Volume / Issue Vol. 38, Issue 42
Published July 01, 2026
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (6)

S

Sang Beom Kim

Department of Energy Engineering Hanyang University Seoul Republic of Korea

E

Eui Hyun Suh

Department of Chemistry and Biochemistry

T

Taek Seong Lee

Department of Energy Engineering Hanyang University Seoul Republic of Korea

A

Andreas W. Erhardt

I

Iain McCulloch

Chemistry Research Laboratory, University of Oxford, 12 Mansfield Road, Oxford OX1 3TA, U.K.

J

Jaeyoung Jang

Department of Energy Engineering Hanyang University Seoul Republic of Korea