Journal of the American Chemical Society

Single-Atom-Layer-Induced Reversed Diffusion Pathway of Reactive Metal–Support Interaction

X Xiao Han S Shuwen Niu (College of Chemistry and Chemical Engineering) G Geng Wu (Sanya Science and Education Innovation Park of Wuhan University of Technology) X Xiaolin Tai (State Key Laboratory of Precision and Intelligent Chemistry, School of Chemistry and Materials Science) H Haohui Hu (Hefei National Research Center for Physical Sciences at the Microscale, Department of Applied Chemistry) F Fanfei Sun (Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute) H Haiwei Liang (Hefei National Research Center for Physical Sciences at the Microscale, Department of Applied Chemistry) X Xun Hong (Hefei National Research Center for Physical Sciences at the Microscale, Department of Applied Chemistry) Y Yue Lin
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Article Details

Volume / Issue Vol. 147, Issue 49
Published December 10, 2025
Pages 44825-44833
ISSN 0002-7863
Publisher American Chemical Society

Journal Info

Journal of the American Chemical Society

American Chemical Society
ISSN: 0002-7863 Physical Sciences

Authors (9)

X

Xiao Han

S

Shuwen Niu

College of Chemistry and Chemical Engineering

G

Geng Wu

Sanya Science and Education Innovation Park of Wuhan University of Technology

X

Xiaolin Tai

State Key Laboratory of Precision and Intelligent Chemistry, School of Chemistry and Materials Science

H

Haohui Hu

Hefei National Research Center for Physical Sciences at the Microscale, Department of Applied Chemistry

F

Fanfei Sun

Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute

H

Haiwei Liang

Hefei National Research Center for Physical Sciences at the Microscale, Department of Applied Chemistry

X

Xun Hong

Hefei National Research Center for Physical Sciences at the Microscale, Department of Applied Chemistry

Y

Yue Lin

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