Short‐Wavelength Infrared Imaging with Organic Photodetectors Based on Non‐Fullerene Acceptors with Detection above 1200 nm

Z Zhuoran Qiao S Sandeep Sharma Y Yakun He M Marie Houot (Department of Chemistry and Centre for Processable Electronics) K Kun‐Han Lin (Department of Chemical Engineering National Tsing Hua University Hsinchu Taiwan) D Davide Nodari (Department of Chemistry and Centre for Processable Electronics, Imperial College London London UK) F Filip Aniés M Matilde Brunetta P Patipan Sukpoonprom (Department of Chemistry and Centre for Processable Electronics Imperial College London London UK) E Eunyoung Hong (Department of Chemistry and Centre for Processable Electronics Imperial College London London UK) E Edoardo Angela Z Zian Wang (Chemistry Research Laboratory) P Pichaya Pattanasattayavong M Martyn A. McLachlan A Artem Bakulin (Department of Chemistry and Centre for Processable Electronics Imperial College London London UK) D Denis Andrienko (Max Planck Institute for Polymer Research, Ackermannweg 10, Mainz 55128, Germany) F Frederic Laquai M Martin Heeney (Division of Physical Sciences & Engineering, Chemistry Program) N Nicola Gasparini

Abstract

ABSTRACT Organic photodetectors (OPDs) have emerged as promising candidates for next‐generation light‐detecting technologies. Compared to traditional inorganic photodetectors (e.g. silicon and indium gallium arsenide), OPDs offer advantages including lower fabrication cost, intrinsic mechanical flexibility, and tunable detection range. However, their performance still lags behind that of traditional detectors, particularly in the near‐infrared region. In this work, two low band gap non‐fullerene acceptors, BZIC‐2F and BZIC‐2Cl are synthesized, both exhibiting absorption onsets beyond 1200 nm. OPDs based on BZIC‐2F deliver superior performance when blended with the low‐cost donor P3HT, achieving spectral responsivity values of 0.49 A W −1 (1010 nm under −2 V) and a specific detectivity of 1.30 × 10 12 Jones, outperforming benchmark commercial silicon detectors in the shortwave infrared (SWIR) range, while maintaining stable photoresponse over 3 million on/off illumination cycles. Furthermore, a prototype blade‐coated active‐matrix imager is fabricated in air on an amorphous silicon backplane. The imager exhibits a broadband light detection range spanning from visible to SWIR, enabling practical applications such as faint infrared light imaging, semiconductor wafer inspection, LiDAR light detection, and banknote verification. Combined with detailed materials cost analysis, this work represents the first demonstration of an integrated active‐matrix imager employing a fully organic semiconductor photoactive layer capable of high‐speed SWIR imaging, highlighting its promise for a scalable and cost‐effective next‐generation SWIR photodetector.

Article Details

Volume / Issue Vol. 38, Issue 31
Published June 01, 2026
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (19)

Z

Zhuoran Qiao

S

Sandeep Sharma

Y

Yakun He

M

Marie Houot

Department of Chemistry and Centre for Processable Electronics

K

Kun‐Han Lin

Department of Chemical Engineering National Tsing Hua University Hsinchu Taiwan

D

Davide Nodari

Department of Chemistry and Centre for Processable Electronics, Imperial College London London UK

F

Filip Aniés

M

Matilde Brunetta

P

Patipan Sukpoonprom

Department of Chemistry and Centre for Processable Electronics Imperial College London London UK

E

Eunyoung Hong

Department of Chemistry and Centre for Processable Electronics Imperial College London London UK

E

Edoardo Angela

Z

Zian Wang

Chemistry Research Laboratory

P

Pichaya Pattanasattayavong

M

Martyn A. McLachlan

A

Artem Bakulin

Department of Chemistry and Centre for Processable Electronics Imperial College London London UK

D

Denis Andrienko

Max Planck Institute for Polymer Research, Ackermannweg 10, Mainz 55128, Germany

F

Frederic Laquai

M

Martin Heeney

Division of Physical Sciences & Engineering, Chemistry Program

N

Nicola Gasparini