Sharpened Dirac Cone and Elevated Carrier Mobility in Bi <sub>4</sub> Te <sub>3</sub> Engineered by a High [Bi <sub>2</sub> ] Bilayer Content for Thermoelectrics

C Chao Guo F Fei Jia (Hangzhou Institute of Medicine) Y Yu‐Qian Wu (Department of Chemistry, Faculty of Arts and Sciences and Center for Advanced Materials Research Beijing Normal University Zhuhai People's Republic of China) X Xin‐Yi Liu (Department of Chemistry, Faculty of Arts and Sciences and Center for Advanced Materials Research Beijing Normal University Zhuhai People's Republic of China) Y Yi‐Meng Liu (Department of Chemistry, Faculty of Arts and Sciences and Center for Advanced Materials Research Beijing Normal University Zhuhai People's Republic of China) L Ling Chen (State Key Laboratory of Chemical Resource Engineering, College of Chemistry) L Li‐Ming Wu (Center For Advanced Materials Research Beijing Normal University Zhuhai China)

Abstract

ABSTRACT The [Bi 2 ] m [Bi 2 Te 3 ] n family features a natural heterostructure of metallic [Bi 2 ] bilayers (BL) and topological insulator [Bi 2 Te 3 ] quintuple layers (QL). We demonstrate that increasing the BL ratio (( m /( m + n ))) enhances key thermoelectric properties. Bi 4 Te 3 ( m = 3; n = 3) exhibits a sharpened Dirac cone and a high carrier mobility (117 cm 2 V −1 s −1 ) twice that of Bi 1 Te 1 ( m = 1; n = 2). This stems from strengthened σ ‐bonding interlayer coupling, which reduces the carrier effective mass. Concurrently, the abundant [Bi 2 ]‐BL lower Te vacancy formation energy, suppressing electron carrier concentration and synergistically boosting the Seebeck coefficient. This work provides the first direct experimental and theoretical evidence for the sharpening of the Dirac cone via a metallic [Bi 2 ] bilayer engineering strategy. It addresses the key limitations of Bi 1 Te 1 , and the established structure‐property relationship, together with the metallic [Bi 2 ]‐BL engineering strategy for sharpening the Dirac cone, further offers valuable insights for the rational design of thermoelectric materials and performance optimization across the entire Bi/Te material family.

Article Details

Volume / Issue Vol. 65, Issue 11
Published March 09, 2026
ISSN 1433-7851
Publisher Wiley

Journal Info

Angewandte Chemie International Edition

Wiley

ISSN: 1433-7851 Physical Sciences

Authors (7)

C

Chao Guo

F

Fei Jia

Hangzhou Institute of Medicine

Y

Yu‐Qian Wu

Department of Chemistry, Faculty of Arts and Sciences and Center for Advanced Materials Research Beijing Normal University Zhuhai People's Republic of China

X

Xin‐Yi Liu

Department of Chemistry, Faculty of Arts and Sciences and Center for Advanced Materials Research Beijing Normal University Zhuhai People's Republic of China

Y

Yi‐Meng Liu

Department of Chemistry, Faculty of Arts and Sciences and Center for Advanced Materials Research Beijing Normal University Zhuhai People's Republic of China

L

Ling Chen

State Key Laboratory of Chemical Resource Engineering, College of Chemistry

L

Li‐Ming Wu

Center For Advanced Materials Research Beijing Normal University Zhuhai China