Sestrin3 confers resistance to recombinant human arginase in small cell lung cancer by activating Akt/mTOR/ASS1 axis

Z Zhongqiang Zhang Z Zizhe Lin W Weishan Li (National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, School of Materials Science and Engineering) B Binxiong Chen Y Yueming Liu H Hanchao Gao S Shi Xu

Abstract

Drug resistance is a major obstacle in the clinical management of small cell lung cancer (SCLC), we have proved the promising anticancer effect of recombinant human arginase (rhArg, BCT-100) in SCLC in vitro and in vivo . In order to promote the clinical application of recombinant human arginase, it is necessary to explore the underlying resistant mechanisms of BCT-100 in SCLC. Here, we cultured and obtained the acquired drug-resistant SCLC cell line (H446-BR), which displayed different cellular phenotypes (enhanced migration ability) compared with the parental cell line (H446). sestrin3 (SESN3) was confirmed with high expression in resistant cell line. Knockdown SESN3 could re-sensitize resistant cells to BCT-100 treatment and reverse the aggressive feature of H446-BR. The Akt-mTOR signal pathway and ASS1, which were highly expressed in resistant cells, were down-regulated after silencing SESN3. MK-2206 and rapamycin suppressed the expression of ASS1 in H446-BR cell. In xenograft model, BCT-100 has little anti-tumor effect on H446-BR compared with H446 as well as H446-BR silenced sestrin3. Collectively, these results elucidate SESN3 plays an essential role in resistant mechanism, which will provide a valuable source of information for translational research.

Article Details

Journal PLoS ONE
Volume / Issue Vol. 20, Issue 12
Published December 29, 2025
Pages e0338802
ISSN 1932-6203
Publisher Public Library of Science

Journal Info

PLoS ONE

Public Library of Science

ISSN: 1932-6203 Open Access Health Sciences

Authors (7)

Z

Zhongqiang Zhang

Z

Zizhe Lin

W

Weishan Li

National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, School of Materials Science and Engineering

B

Binxiong Chen

Y

Yueming Liu

H

Hanchao Gao

S

Shi Xu