Second harmonic generation by lithium metasilicate grains in photocrystallized glass

S Sergey Scherbak (Laboratory of Optics of Heterogenious Structures and Optical Materials, Alferov University 1 , St. Petersburg 194021,) V Vladimir Kaasik (Laboratory of Optics of Heterogenious Structures and Optical Materials, Alferov University 1 , St. Petersburg 194021,) A Alexey Redkov (Laboratory of Structural and Phase Transformations in Condensed Matter, Institute for Problems in Mechanical Engineering of the Russian Academy of Sciences 3 , St. Petersburg 199178,) A Andrey Lipovskii (Laboratory of Optics of Heterogenious Structures and Optical Materials, Alferov University 1 , St. Petersburg 194021,)

Abstract

The present work explores the formation of lithium metasilicate (Li2SiO3) crystalline grains in a photosensitive glass similar to Foturan® and the nonlinear optical characteristics displayed by the formed composite material. For partial crystallization of the glass, we applied the conventional three-step procedure: UV irradiation, primary heat treatment, and secondary annealing at higher temperature. The formation of crystalline Li2SiO3 was confirmed by Raman spectroscopy. The specimens exhibit quadratic optical nonlinearity without poling. The measured patterns of second optical harmonic radiation of the fabricated specimens demonstrate a two-lobe shape, characteristic of μm-sized second harmonic sources. Simulations in accordance with the nonlinear Rayleigh–Gans–Debye scattering model allowed us to estimate the average grain sizes: ∼1.0 μm after 20 min of secondary anneal, ∼2.7 μm after 40 min, and ∼4.7 μm after 60 min. The UV exposure duration shows a weak influence on the grain size. The combination of photolithography defining UV-irradiated regions with annealing-controlled crystallite size appears to be a promising approach for the fabrication of multi-element structures capable of generating second harmonics with a desired radiation pattern.

Article Details

Volume / Issue Vol. 140, Issue 7
Published August 21, 2026
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (4)

S

Sergey Scherbak

Laboratory of Optics of Heterogenious Structures and Optical Materials, Alferov University 1 , St. Petersburg 194021,

V

Vladimir Kaasik

Laboratory of Optics of Heterogenious Structures and Optical Materials, Alferov University 1 , St. Petersburg 194021,

A

Alexey Redkov

Laboratory of Structural and Phase Transformations in Condensed Matter, Institute for Problems in Mechanical Engineering of the Russian Academy of Sciences 3 , St. Petersburg 199178,

A

Andrey Lipovskii

Laboratory of Optics of Heterogenious Structures and Optical Materials, Alferov University 1 , St. Petersburg 194021,