Ru alloying in Ni/Al reactive multilayers: Experimental observations and molecular dynamics simulations

N Nensi Toncich (1 Laboratory for Nanometallurgy, Department of Materials, ETH Zürich, Zürich, Switzerland) A Ankit Yadav (2 Institute of Physics of Materials, The Czech Academy of Sciences, Žižkova 22, 616 00, Brno, Czech Republic) J Jan Fikar (2 Institute of Physics of Materials, The Czech Academy of Sciences, Žižkova 22, 616 00, Brno, Czech Republic) R Ralph Spolenak (1 Laboratory for Nanometallurgy, Department of Materials, ETH Zürich, Zürich, Switzerland)

Abstract

Reactive multilayer thin films, a class of energetic materials, are increasingly recognized for their potential in joining applications, utilizing the chemical energy released as heat during exothermic reactions. These materials also hold promise for additional diverse technological applications, which require precise control over heat release rates and reaction propagation velocities. The microstructural properties of reactive multilayers play a critical role in determining their chemical reaction behavior. Among these, Ni/Al reactive multilayers have been extensively studied and used due to their favorable characteristics. In this study, we explore the incorporation of ruthenium (Ru) as a co-alloying element with nickel (Ni) in the Ni/Al system to investigate its impact on the material properties, with a particular focus on reaction velocity and temperature. Ru enhances the reaction rates but also causes a composition-dependent phase transition in the as-deposited state from fcc to hcp. Additionally, molecular dynamics simulations are employed to examine the effects of Ru co-alloying with Ni, providing deeper insights into the underlying mechanisms. This work aims to advance the understanding of Ru’s role in influencing the performance of Ni/Al-based reactive multilayers for advanced applications.

Article Details

Volume / Issue Vol. 140, Issue 2
Published July 14, 2026
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (4)

N

Nensi Toncich

1 Laboratory for Nanometallurgy, Department of Materials, ETH Zürich, Zürich, Switzerland

A

Ankit Yadav

2 Institute of Physics of Materials, The Czech Academy of Sciences, Žižkova 22, 616 00, Brno, Czech Republic

J

Jan Fikar

2 Institute of Physics of Materials, The Czech Academy of Sciences, Žižkova 22, 616 00, Brno, Czech Republic

R

Ralph Spolenak

1 Laboratory for Nanometallurgy, Department of Materials, ETH Zürich, Zürich, Switzerland