Room temperature operation of Ge/Si <i>x</i> Ge1− <i>x</i> − <i>y</i> Sn <i>y</i> terahertz quantum cascade lasers predicted using extended combined resonant tunneling and rate equation model

Z Zhou Li (School of Materials Science and Engineering) Z Zhichao Chen (Department of Pharmaceutics, Wuya College of Innovation) B Baiqi Zhang Q Qiyun Lai (Quantum Science Center of Guangdong-Hongkong-Macau Greater Bay Area 1 , Shenzhen 518000,) Z Zhanfeng Jiang (College of Physics and Optoelectronic Engineering, Shenzhen University 4 , Shenzhen 518060,) Y Yaoyao Liang (Quantum Science Center of Guangdong-Hongkong-Macau Greater Bay Area 1 , Shenzhen 518000,) Y Yulong Fan (Quantum Science Center of Guangdong-Hongkong-Macau Greater Bay Area 1 , Shenzhen 518000,) H Haoxiang Li (State Key Laboratory of Chemo/Biosensing and Chemometrics, College of Chemistry and Chemical Engineering, School of Biomedical Sciences) Q Qi Qin M Manijeh Razeghi (Center for Quantum Devices, Department of Electrical Engineering and Computer Science, Northwestern University 6 , Evanston, Illinois 60208,) F Feihu Wang (Department of Chemistry)

Abstract

Raising operation temperature of terahertz (THz) quantum cascade lasers (QCLs) to room temperature remains a key challenge in QCL community. Group-IV semiconductors are believed to be a promising solution to this problem since the polar phonon–electron scattering is negligible at elevated temperature. Here, we develop a theoretical model for Ge/SixGe1−x−ySny THz QCL development. This model is established on the combined resonant tunneling and rate equation framework and is extended to be applicable for group-IV QCL design through introducing new scattering mechanisms and continuum states carrier leakage. A two-well Ge/Si0.3Ge0.618Sn0.082 THz QCL based on a direct phonon extraction strategy is designed and predicted to be capable of working above 300 K. This result lays the foundation for future room temperature THz QCL devices development using group-IV semiconductors.

Article Details

Volume / Issue Vol. 138, Issue 23
Published December 21, 2025
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (11)

Z

Zhou Li

School of Materials Science and Engineering

Z

Zhichao Chen

Department of Pharmaceutics, Wuya College of Innovation

B

Baiqi Zhang

Q

Qiyun Lai

Quantum Science Center of Guangdong-Hongkong-Macau Greater Bay Area 1 , Shenzhen 518000,

Z

Zhanfeng Jiang

College of Physics and Optoelectronic Engineering, Shenzhen University 4 , Shenzhen 518060,

Y

Yaoyao Liang

Quantum Science Center of Guangdong-Hongkong-Macau Greater Bay Area 1 , Shenzhen 518000,

Y

Yulong Fan

Quantum Science Center of Guangdong-Hongkong-Macau Greater Bay Area 1 , Shenzhen 518000,

H

Haoxiang Li

State Key Laboratory of Chemo/Biosensing and Chemometrics, College of Chemistry and Chemical Engineering, School of Biomedical Sciences

Q

Qi Qin

M

Manijeh Razeghi

Center for Quantum Devices, Department of Electrical Engineering and Computer Science, Northwestern University 6 , Evanston, Illinois 60208,

F

Feihu Wang

Department of Chemistry