Journal of the American Chemical Society

Reversible CO Insertion into the Si = Si Double Bond Enables a Disila-Bislactone Formation via Subsequent CO<sub>2</sub> Addition

F Fiona J. Kiefer (TUM School of Natural Sciences, Department of Chemistry, Institute of Silicon Chemistry and Catalysis Research Center, Technische Universität München, Lichtenbergstraße 4, Garching bei München 85748, Germany) A Arseni Kostenko (TUM School of Natural Sciences, Department of Chemistry, Institute of Silicon Chemistry and Catalysis Research Center, Technische Universität München, Lichtenbergstraße 4, Garching bei München 85748, Germany) R Richard Holzner (TUM School of Natural Sciences, Department of Chemistry, Institute of Silicon Chemistry and Catalysis Research Center, Technische Universität München, Lichtenbergstraße 4, Garching bei München 85748, Germany) S Shigeyoshi Inoue (TUM School of Natural Sciences, Department of Chemistry, Institute of Silicon Chemistry and Catalysis Research Center, Technische Universität München, Lichtenbergstraße 4, Garching bei München 85748, Germany)
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Article Details

Volume / Issue Vol. 147, Issue 30
Published July 30, 2025
Pages 26663-26673
ISSN 0002-7863
Publisher American Chemical Society

Journal Info

Journal of the American Chemical Society

American Chemical Society
ISSN: 0002-7863 Physical Sciences

Authors (4)

F

Fiona J. Kiefer

TUM School of Natural Sciences, Department of Chemistry, Institute of Silicon Chemistry and Catalysis Research Center, Technische Universität München, Lichtenbergstraße 4, Garching bei München 85748, Germany

A

Arseni Kostenko

TUM School of Natural Sciences, Department of Chemistry, Institute of Silicon Chemistry and Catalysis Research Center, Technische Universität München, Lichtenbergstraße 4, Garching bei München 85748, Germany

R

Richard Holzner

TUM School of Natural Sciences, Department of Chemistry, Institute of Silicon Chemistry and Catalysis Research Center, Technische Universität München, Lichtenbergstraße 4, Garching bei München 85748, Germany

S

Shigeyoshi Inoue

TUM School of Natural Sciences, Department of Chemistry, Institute of Silicon Chemistry and Catalysis Research Center, Technische Universität München, Lichtenbergstraße 4, Garching bei München 85748, Germany

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