Relaxor Antiferroelectric Dynamics for Neuromorphic Computing

D Dongliang Yang (Beijing Synchrotron Radiation Facility, Institute of High Energy Physics) Y Yinan Lin W Weifan Meng Z Zhongyi Wang H Huihan Li C Ce Li Z Zirui Zhang (State Key Laboratory of Bioactive Substance and Function of Natural Medicines, Institute of Materia Medica) Q Qianyu Zhang (College of Materials Science and Engineering) J Junqi You (Centre for Quantum Physics Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE) School of Physics Beijing Institute of Technology Beijing 100081 P. R. China) J Jiarui Wang (School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore) T Tianze Yu Y Yutao Li (Beijing National Laboratory for Condensed Matter Physics) W Weiting Miao (Centre for Quantum Physics Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE) School of Physics Beijing Institute of Technology Beijing 100081 P. R. China) W Weili Zhen F Fei Xue (State Key Laboratory of Physical Chemistry of Solid Surfaces, College of Chemistry and Chemical Engineering) R Ruixiang Fei L Linfeng Sun

Abstract

Abstract Relaxor antiferroelectric (AFE) materials display a gradual polarization response and high energy storage density with polarization slowly reverting after removing an external field. This distinctive polarization‐switching behavior closely resembles synaptic plasticity in biological nervous systems, presenting substantial potential for neuromorphic computing applications. Especially, its 2D scenario exhibits unique physical properties and maintains stability at atomic thickness due to their antipolar alignment, which effectively eliminates the depolarization field effect. Such stable 2D relaxor AFE materials offer significant advantages for integrating these materials into modern electronic devices for neuromorphic computing. In this study, the potential of a novel quaternary layered AFE material, CuBiP₂Se₆ (CBPS), is explored for neuromorphic device applications. CBPS exhibits a broad range of light absorption and stable relaxor AFE behavior, rendering it an outstanding candidate for optoelectronic synaptic devices. High‐quality CBPS is synthesized and its AFE properties through various characterization techniques are verified. CBPS‐based synaptic devices demonstrate dual‐mode tunable resistance plasticity stimulated by both electrical and optical inputs, demonstrating the capacity to perform in‐sensor computing for image restoration tasks. These findings suggest that relaxor AFE materials like CBPS could provide a robust platform for various brain‐inspired applications, particularly in neuromorphic computing, and artificial visual systems.

Article Details

Volume / Issue Vol. 37, Issue 27
Published July 01, 2025
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (17)

D

Dongliang Yang

Beijing Synchrotron Radiation Facility, Institute of High Energy Physics

Y

Yinan Lin

W

Weifan Meng

Z

Zhongyi Wang

H

Huihan Li

C

Ce Li

Z

Zirui Zhang

State Key Laboratory of Bioactive Substance and Function of Natural Medicines, Institute of Materia Medica

Q

Qianyu Zhang

College of Materials Science and Engineering

J

Junqi You

Centre for Quantum Physics Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE) School of Physics Beijing Institute of Technology Beijing 100081 P. R. China

J

Jiarui Wang

School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore

T

Tianze Yu

Y

Yutao Li

Beijing National Laboratory for Condensed Matter Physics

W

Weiting Miao

Centre for Quantum Physics Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE) School of Physics Beijing Institute of Technology Beijing 100081 P. R. China

W

Weili Zhen

F

Fei Xue

State Key Laboratory of Physical Chemistry of Solid Surfaces, College of Chemistry and Chemical Engineering

R

Ruixiang Fei

L

Linfeng Sun