Regional chemical potential analysis for material surfaces

Abstract

We propose a local regional chemical potential (RCP) analysis method based on an energy window scheme to quantitatively estimate the selectivity of atomic and molecular adsorption on surfaces, as well as the strength of chemical bonding forces between a probe tip and a surface in atomic force microscopy (AFM) measurements. In particular, focusing on the local picture of covalent bonding, we use a simple H2 molecular model to demonstrate a clear relationship between chemical bonding forces and the local RCP. Moreover, density functional theory calculations on molecular systems and diamond C(001) surfaces reveal that the local RCP at the surfaces successfully visualizes electron-donating regions such as dangling bonds and double bonds. These results suggest that the local RCP can serve as an effective measure to analyze high-resolution non-contact or near-contact AFM images enhanced by chemical bonding forces. Analogous to the Tersoff–Hamann approach widely used for simulating scanning tunneling microscopy images, the RCP analysis method provides a practical and computationally efficient framework for interpreting AFM images.