Quantitatively Predicting Angle‐Resolved Polarized Raman Intensity of Anisotropic Layered Materials

J Jia‐Liang Xie (State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China) T Tao Liu Y Yu‐Chen Leng (State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China) R Rui Mei (State Key Laboratory of Semiconductor Physics and Chip Technologies) H Heng Wu C Chen‐Kai Liu (State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China) J Jia‐Hong Wang (Center of Materials Science and Optoelectronics Engineering University of Chinese Academy of Sciences Beijing 100049 China) Y Yang Li X Xue‐Feng Yu (Materials Artificial Intelligence Center, Shenzhen Institutes of Advanced Technology Chinese Academy of Sciences 1068 Xueyuan Avenue Shenzhen 518055 P.R. China) M Miao‐Ling Lin (State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China) P Ping‐Heng Tan (State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China)

Abstract

Abstract Angle‐resolved polarized Raman (ARPR) spectroscopy provides insights into optical anisotropy and symmetry‐related electron–photon/electron–phonon couplings of anisotropic layered materials (ALMs). However, since their discovery over ten years ago, ARPR responses in ALM flakes has exhibited a puzzling dependence on flake thickness, excitation wavelength, and dielectric environment, complicating their understanding and prediction. By taking black phosphorus (BP) (⩾20 nm) flakes and four‐layer Td‐WTe 2 as examples, this study introduces intrinsic Raman tensors ( R int ) and proposes strategies to predict the ARPR intensity profiles of thick and atomically‐thin ALM flakes by considering birefringence, linear dichroism and multilayer interference inside multilayered structures with experimentally determined complex refractive indexes along in‐plane axes and complex tensor elements of R int for the corresponding phonon modes. The tensor elements of effective Raman tensors ( R eff ), which are directly linked to the polarization vectors of incident and scattered light outside the ALM surface, are derived to quantitatively predict ARPR intensity for these ALM flakes, showing intricate dependence on ALM thickness, dielectric substrates, and excitation wavelengths. This framework can be extended to other ALM flakes from atomically‐thin layers to bulk limit, facilitating comprehensive prediction of their ARPR intensity regardless of layer‐dependent electronic properties.

Article Details

Volume / Issue Vol. 37, Issue 40
Published October 01, 2025
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (11)

J

Jia‐Liang Xie

State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China

T

Tao Liu

Y

Yu‐Chen Leng

State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China

R

Rui Mei

State Key Laboratory of Semiconductor Physics and Chip Technologies

H

Heng Wu

C

Chen‐Kai Liu

State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China

J

Jia‐Hong Wang

Center of Materials Science and Optoelectronics Engineering University of Chinese Academy of Sciences Beijing 100049 China

Y

Yang Li

X

Xue‐Feng Yu

Materials Artificial Intelligence Center, Shenzhen Institutes of Advanced Technology Chinese Academy of Sciences 1068 Xueyuan Avenue Shenzhen 518055 P.R. China

M

Miao‐Ling Lin

State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China

P

Ping‐Heng Tan

State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China