Quantifying water hydrogen bonding from the surface electrostatic potential at varying iso-density contours

G Goedele Roos (Univ. Lille, CNRS, UMR 8576 - UGSF - Unité de Glycobiologie Structurale et Fonctionnelle 1 , F-59000 Lille,) D Danny E. P. Vanpoucke (Hasselt University, Institute for Materials Research (imo-imomec), Quantum & Artificial inTelligence Design of Materials (QuATOMs) 2 , Martelarenlaan 42, B-3500 Hasselt,) R Ralf Blossey M Marc F. Lensink J Jane S. Murray (Department of Chemistry, University of New Orleans 4 , New Orleans, Louisiana 70148,)

Abstract

The electrostatic potential plotted on varying contours (VS) of the electron density guides us in the understanding of how water interactions exactly take place. Water—H2O—is extremely well balanced, having a hydrogen VS,max and an oxygen VS,min of similar magnitude. As such, it has the capacity to donate and accept hydrogen bonds equally well. This has implications for the interactions that water molecules form, which are reviewed here, first in water–small molecule models and then in complex sites as lactose and its crystals and in protein–protein interfaces. Favorable and unfavorable interactions are evaluated from the electrostatic potential plotted on varying contours of the electronic density, allowing these interactions to be readily visualized. As such, with one calculation, all interactions can be analyzed by gradually looking deeper into the electron density envelope and finding the nearly touching contour. Its relation with interaction strength has the electrostatic potential to be used in scoring functions. When properly implemented, we expect this approach to be valuable in modeling and structure validation, avoiding tedious interaction strength calculations. Here, applied to water interactions in a variety of systems, we conclude that all water interactions take the same general form, with water behaving as a “neutral” agent, allowing its interaction partner to determine if it donates or accepts a hydrogen bond, or both, as determined by the highest possible interaction strength(s).

Article Details

Volume / Issue Vol. 163, Issue 11
Published September 21, 2025
ISSN 0021-9606
Publisher American Institute of Physics

Journal Info

The Journal of Chemical Physics

American Institute of Physics

ISSN: 0021-9606 Physical Sciences

Authors (5)

G

Goedele Roos

Univ. Lille, CNRS, UMR 8576 - UGSF - Unité de Glycobiologie Structurale et Fonctionnelle 1 , F-59000 Lille,

D

Danny E. P. Vanpoucke

Hasselt University, Institute for Materials Research (imo-imomec), Quantum & Artificial inTelligence Design of Materials (QuATOMs) 2 , Martelarenlaan 42, B-3500 Hasselt,

R

Ralf Blossey

M

Marc F. Lensink

J

Jane S. Murray

Department of Chemistry, University of New Orleans 4 , New Orleans, Louisiana 70148,