Probing ultraweak in-plane magnetic anisotropy within a two-dimensional layered antiferromagnet
Abstract
Magnetic anisotropy plays a crucial role in determining the critical behavior and phase transitions in two-dimensional magnetic systems. It is also required for the design of thin-film spintronic devices. Despite its significance, sensing extremely weak anisotropy has proven challenging in van der Waals antiferromagnetic/ferrimagnetic materials. Here, we first employ simulations of micromagnetic energy function in few-layer easy-plane antiferromagnetic systems with a weak additional uniaxial anisotropy and unveil an intriguing even–odd effect closely linked to low-field spin–flop behaviors. We further perform tunneling magneto-conductance measurements on a model 2D antiferromagnetic insulator, CrCl 3 , exhibiting near-ideal easy-plane anisotropy. The magnetic field-controlled tunneling current at low temperature aligns well with simulated in-plane anisotropic spin-configuration, providing direct experimental evidence for detecting magnetic anisotropy field around 1 mT. Our work creates opportunities for finely characterizing magnetic structures and behaviors in 2D antiferromagnetic/ferrimagnetic systems, with potential applications in spintronics such as data storage and magnetic sensing.
Article Details
Journal Info
Proceedings of the National Academy of Sciences
National Academy of Sciences
Authors (15)
Yijie Fan
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Shanghai Jiao Tong University
Yihong Xu
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Shanghai Jiao Tong University
Renji Bian
School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China
Ruan Zhang
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Shanghai Jiao Tong University
Junning Mei
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Shanghai Jiao Tong University
Jiaxin Wu
Binghe Xie
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Shanghai Jiao Tong University
Shuangxing Zhu
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Shanghai Jiao Tong University
Yu Chen
Feifan Gu
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Shanghai Jiao Tong University
Ying Liu
Takashi Taniguchi
Kenji Watanabe
Fucai Liu
School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China
Xinghan Cai
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Shanghai Jiao Tong University